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机译:射频磁控溅射法在康宁7059玻璃上制备β-FeSi_2连续膜
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University, 4-17-1 Wakasato, Nagano 380-8553, Japan;
iron disilicide; continuous film; corning 7059 glass; vacuum annealing; X-ray diffraction; focused-ion beam; secondary-ion microscope; scanning probe microscope; hall measurement; X-ray photoelectron spectroscopy;
机译:通过两步制造方法在表面声波应用中在叉指式康宁7059玻璃基板上生长ZnO薄膜
机译:康宁7059玻璃和ZnO薄膜的固相激光退火的卢瑟福背散射证据
机译:射频磁控溅射沉积非晶膜后退火制备的YIG(Y_3Fe_5O_(12))薄膜的磁性
机译:7059玻璃射频磁控溅射La掺杂Basno_3薄膜的结构和性能
机译:射频磁控溅射砷化镓,碲化砷硒和硅薄膜的制备和表征。
机译:在玻璃基板上用铁磁L10-FePt(001)电极溅射制备(001)BiFeO3薄膜
机译:通过RF-磁控溅射系统制备的SiO2掺杂ZnO膜的电气和光学性质
机译:射频磁控溅射制备Gaas薄膜