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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >β-FeSi_2 Continuous Films Prepared on Corning 7059 Glass by RF-Magnetron Sputtering
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β-FeSi_2 Continuous Films Prepared on Corning 7059 Glass by RF-Magnetron Sputtering

机译:射频磁控溅射法在康宁7059玻璃上制备β-FeSi_2连续膜

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摘要

More than 1-μm-thick single-phase β-FeSi_2 continuous films on Corning 7059 glass and quartz have been obtained by an easy method. We controlled the Si/Fe composition ratio of Fe-Si precursor using a Si target with sectorial Fe plates placed on it. Both surface flatness of the film and β-FeSi_2/substrate interface were satisfactory, and cracks were not observed by secondary ion microscopy. Suitable electric properties of β-FeSi_2 for solar cell absorption layers (p-type, 5Ω·cm, 40 cm/(V·s), and 1 x 10~(17) cm~(-3)) were obtained from a Si/Fe = 1.7 Fe-rich precursor.
机译:通过一种简便的方法,已经在康宁7059玻璃和石英上获得了厚度超过1μm的单相β-FeSi_2连续膜。我们使用带有扇形铁板的硅靶控制了铁硅前体的硅/铁组成比。膜的表面平整度和β-FeSi_2/基底界面均令人满意,并且通过二次离子显微镜未观察到裂纹。由Si获得了β-FeSi_2用于太阳能电池吸收层的合适的电学性质(p型,5Ω·cm,40 cm /(V·s)和1 x 10〜(17)cm〜(-3))。 / Fe = 1.7富铁前体。

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