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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Photocatalytic Properties of TiO_2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
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Photocatalytic Properties of TiO_2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes

机译：中频双阴极反应溅射沉积TiO_2薄膜的光催化性能

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摘要

Titanium dioxide (TiO_2) films were deposited on unheated nonalkali glass substrates by reactive midfrequency (mf) magnetron sputtering using dual cathodes with two Ti metal targets. In order to maintain the very high deposition rate, the depositions were successfully carried out stably in the "transition region" between the metallic and reactive (oxide) sputter modes using plasma control units (PCU). Very high-rate depositions of 12-70nm/min were successfully achieved in the deposition of TiO_2 films throughout the whole "transition region". The as-deposited films deposited in the "oxide mode" had a polycrystalline anatase structure and exhibited both photoinduced hydrophilicity and photodecomposition of acetaldehyde. Whereas, all the as-deposited TiO_2 films deposited in the "transition region" had amorphous structure, which did not exhibit photocatalytic activity. Such amorphous films deposited in the transition region were crystallized by postannealing in air at 200℃ or 300℃ and were then shown to have photocatalytic activity. Very thin TiO_2 films with a thickness of 25 nm deposited in the transition region and postannealed at 300℃ exhibited photoinduced hydrophilicity, whereas there was a clear thickness dependence of photodecomposition and the rather thick films of 300 nm exhibited pronounced photodecomposition.
机译：使用具有两个Ti金属靶的双阴极，通过反应中频（mf）磁控溅射，将二氧化钛（TiO_2）膜沉积在未加热的无碱玻璃基板上。为了保持非常高的沉积速率，使用等离子体控制单元（PCU）在金属和反应（氧化物）溅射模式之间的“过渡区域”成功地稳定进行了沉积。在整个“过渡区”的TiO_2薄膜沉积过程中，成功实现了12-70nm / min的非常高速率的沉积。以“氧化物模式”沉积的沉积膜具有多晶锐钛矿结构，并且表现出光诱导的亲水性和乙醛的光分解。而所有沉积在“过渡区”中的TiO_2薄膜均具有非晶态结构，不具有光催化活性。通过在200℃或300℃的空气中进行后退火，使沉积在过渡区中的这种非晶膜结晶，然后显示出具有光催化活性。在过渡区沉积并在300℃下退火的TiO_2薄膜非常薄，厚度为25 nm，表现出光诱导的亲水性，而光分解具有明显的厚度依赖性，而300 nm的相当厚的膜则表现出明显的光分解。

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