A Simple Fabrication Process using Focused Ion Beam for Deep Submicron Magnetic Tunnel Junctions

Daisuke Watanabe; Hitoshi Kubota; Yasuo Ando; Terunobu Miyazaki

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A Simple Fabrication Process using Focused Ion Beam for Deep Submicron Magnetic Tunnel Junctions

机译：深亚微米磁性隧道结使用聚焦离子束的简单制造工艺

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摘要

Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicron-sized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.

机译：聚焦离子束（FIB）诱导的钨沉积技术被用于制造小型（几百纳米级）磁性隧道结（MTJ）。所沉积的钨图案被用作蚀刻掩模以及MTJ和引线之间的金属连接。这种制造方法可以消除一些困难的工艺步骤，从而可以轻松，可重复地制造深亚微米尺寸的MTJ。该技术对于评估自旋电子器件的小型MTJ的基本特性很有用。

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《Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes》 |2004年第11a期|p.7489-7490|共2页
作者
Daisuke Watanabe; Hitoshi Kubota; Yasuo Ando; Terunobu Miyazaki;
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作者单位

Department of Applied Physics, Graduate School of Engineering, Tohoku University, Aoba-yama 05, Aoba-ku, Sendai 980-8579, Japan;

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正文语种 eng
中图分类应用物理学;
关键词
focused ion beam induced deposition; tungsten; submicron; magnetic tunnel junctions;

机译：聚焦离子束诱导沉积钨亚微米磁性隧道结;

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专利

1. Machine-aligned fabrication of submicron SIS tunnel junctions usinga focused ion beam [J] . Bass R.B., Zhang J.Z., Lichtenberger A.W. IEEE Transactions on Applied Superconductivity . 1999,第2期

机译：使用聚焦离子束机器对准制造亚微米SIS隧道结
2. Machine-aligned fabrication of submicron SIS tunnel junctions using a focused ion beam [J] . Bass R.B., Zhang J.Z. IEEE Transactions on Applied Superconductivity . 1999,第2期

机译：使用聚焦离子束的机器对准制造亚微米SIS隧道结
3. Fabrication of submicron Nb/AlOx-Al/Nb tunnel junctions using focused ion beam implanted Nb patterning (FINP) technique [J] . Akaike H., Watanabe T., Nagai N., IEEE Transactions on Applied Superconductivity . 1995,第2期

机译：使用聚焦离子束注入Nb图案化（FINP）技术制造亚微米Nb / AlOx-Al / Nb隧道结
4. Focused ion beam process for a formation of metal/insulator/metal double tunnel junctions [C] . Nakayama, M., Yanagisawa, . 1999

机译：聚焦离子束工艺形成金属/绝缘体/金属双隧道结
5. Development of a Deep Submicron Fabrication Process for Tunneling Field Effect Transistors. [D] . Barth, Michael J. 2011

机译：开发用于隧道场效应晶体管的深亚微米制造工艺。
6. X-ray diffraction imaging of metal–oxide epitaxial tunnel junctions made by optical lithography: use of focused and unfocused X-ray beams [O] . Cristian Mocuta, Antoine Barbier, Stefan Stanescu, -1

机译：用光刻法对金属-氧化物外延隧道结进行X射线衍射成像：使用聚焦和未聚焦X射线束
7. Fabrication of Small Magnetic Tunnel Junctions Using a Focused Ion Beam [O] . D. Watanabe, H. Kubota, Y. Ando, 2004

机译：采用聚焦离子束制造小型磁隧道结

A Simple Fabrication Process using Focused Ion Beam for Deep Submicron Magnetic Tunnel Junctions

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