Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes?

著录项

• 来源
  《Japanese journal of applied physics》 |2019年第se期|SE0803.1-SE0803.17|共17页
• 作者

  Iwase Taku; Kamaji Yoshito; Kang Song Yun; Koga Kazunori; Kuboi Nobuyuki; Nakamura Moritaka; Negishi Nobuyuki; Nozaki Tomohiro; Nunomura Shota; Ogawa Daisuke; Omura Mitsuhiro; Shimizu Tetsuji; Shinoda Kazunori; Sonoda Yasushi; Suzuki Haruka; Takahashi Kazuo; Tsutsumi Takayoshi; Yoshikawa Kenichi; Ishijima Tatsuo; Ishikawa Kenji;

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• 作者单位

  Hitachi Ltd, Kokubunji, Tokyo 1858601, Japan;

  Hitachi High Technol Corp, Kudamatsu, Yamaguchi 7440002, Japan;

  Tokyo Electron Ltd, Akasaka Ku, Minato Ku, Tokyo 1076325, Japan;

  Kyushu Univ, Nishi Ku, Fukuoka, Fukuoka 8190395, Japan;

  Sony Semicond Solut Corp, Atsugi, Kanagawa 2430021, Japan;

  MAMO, Aoba Ku, Yokohama, Kanagawa 2250011, Japan;

  Hitachi Ltd, Hitachi, Ibaraki 3191292, Japan;

  Tokyo Inst Technol, Meguro Ku, Tokyo 1528550, Japan;

  Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan;

  Chubu Univ, Kasugai, Aichi 4878501, Japan;

  Toshiba Memory Corp, Yokaichi, Mie 5128550, Japan;

  Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan;

  Hitachi Ltd, Kokubunji, Tokyo 1858601, Japan;

  Hitachi High Technol Corp, Kudamatsu, Yamaguchi 7440002, Japan;

  Nagoya Univ, Chikusa Ku, Nagoya, Aichi 4648601, Japan;

  Kyoto Inst Technol, Sakyo Ku, Kyoto 6068585, Japan;

  Nagoya Univ, Chikusa Ku, Nagoya, Aichi 4648601, Japan;

  Toshiba Memory Corp, Yokaichi, Mie 5128550, Japan;

  Kanazawa Univ Kakuma, Kanazawa, Ishikawa 9201192, Japan;

  Nagoya Univ, Chikusa Ku, Nagoya, Aichi 4648601, Japan;

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• 正文语种 eng
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