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首页> 外文期刊>Japanese journal of applied physics >Compensation effects between impurity cations in single crystals of a wide gap semiconductor β-Ga_2O_3 prepared by the floating zone method
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Compensation effects between impurity cations in single crystals of a wide gap semiconductor β-Ga_2O_3 prepared by the floating zone method

机译:浮区法制备的宽禁带半导体β-Ga_2O_3单晶中杂质阳离子之间的补偿效应

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摘要

The resistivity rho and Hall coefficient R-H of a wide gap semiconductor beta-Ga2O3 have been investigated using crystals with various Si-doping that were purified by the zone-melting process. For the crystals with the conduction electron density
机译:使用通过区域熔化工艺纯化的具有各种Si掺杂的晶体,研究了宽间隙半导体β-Ga2O3的电阻率rho和霍尔系数R-H。对于具有导电电子密度的晶体

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