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首页> 外文期刊>Japanese journal of applied physics >Effect of Ta-substitution on the deposition of (K,Na)(Nb,Ta)O_3 films by hydrothermal method
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Effect of Ta-substitution on the deposition of (K,Na)(Nb,Ta)O_3 films by hydrothermal method

机译：Ta-替换对（K，Na）（Nb，Ta）O_3膜沉积的影响通过水热法

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Ta substituted (K,Na)NbO3 films have been deposited at 200 degrees C on (001)La:SrTiO3 substrates by hydrothermal method. Film composition continuously changed with increasing the concentration of Ta2O5 in the raw material powder, and X-ray diffraction measurement showed that {001}(c)-oriented epitaxial (KxNa1-x)(Nb1-yTay)O-3 films were obtained for all compositions. Microstructural analysis using scanning electron microscopy and transmission electron microscopy revealed that Ta-substitution made {001}(c) planes dominate on the surface of the film, leading to an improvement in average surface roughness. Film thickness increased with deposition time and eventually saturated. However, the saturated film thickness decreased with increasing Ta/(Nb + Ta) ratio. By evaluating the residual powders synthesized simultaneously with the films, it was found that the formation of the perovskite phase had already started in the very early stage of the deposition process, provided that Ta2O5 powder was present in the source solution. (C) 2019 The Japan Society of Applied Physics
机译：通过水热法在200摄氏度下沉积取代（K，Na）NbO 3薄膜：通过水热法在200℃下沉积（001）：SRTIO3底物。随着原料粉末中的Ta2O5的浓度而连续改变薄膜组合物，并且X射线衍射测量显示{001}（c） - 均向外延（KxNA1-x）（Nb1-ytay）O-3膜所有的组成。使用扫描电子显微镜和透射电子显微镜的微观结构分析显示，Ta-替换使得{001}（c）平面在薄膜表面上占据主导地位，导致平均表面粗糙度的改善。膜厚度随沉积时间而增加，最终饱和。然而，饱和膜厚度随着Ta /（Nb + Ta）比而降低。通过评估与薄膜同时合成的残留粉末，发现钙钛矿相的形成已经在沉积过程的早期阶段开始，只要Ta2O5粉末存在于源溶液中。 （c）2019年日本应用物理学会

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