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The mechanical response of lithographically defined break junctions

机译:光刻定义的断裂结的机械响应

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摘要

We present an experimental study on the mechanical response of lithographically defined break junctions by measuring atomic chain formation, tunneling traces and Gundlach oscillations. The calibration factor, i.e., the ratio between the electrode movement and the bending of the substrate, is found to be 2.5 times larger than expected from a simple mechanical model. This result is consistent with previous finite-element calculations. Comparing different samples, the mechanical response is found to be similar for electrode separations >4 Å. However, for smaller electrode separations significant sample-to-sample variations appear. These variations are ascribed to differences in the shape of the two electrodes on the atomic scale which cannot be controlled by the fabrication process.
机译:我们通过测量原子链形成,隧穿痕迹和Gundlach振荡,对光刻定义的断裂结的机械响应进行了实验研究。发现校准因子,即电极运动与衬底弯曲之间的比率,比简单机械模型所期望的大2.5倍。该结果与先前的有限元计算结果一致。比较不同的样品,发现电极间距> 4Å时的机械响应相似。但是,对于较小的电极间距,会出现明显的样品间差异。这些变化归因于两个电极在原子尺度上的形状差异,该差异不能通过制造工艺来控制。

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  • 来源
    《Journal of Applied Physics》 |2011年第10期|p.747-753|共7页
  • 作者单位

    Physics of Nanodevices, Zernike Institute for Advanced Materials, University ofGroningen, Nijenborgh 4,974% AG Groningen, The Netherlands;

    Physics of Nanodevices, Zernike Institute for Advanced Materials, University ofGroningen, Nijenborgh 4,974% AG Groningen, The Netherlands,Kamerlingh Onnes Laboratorium, Leiden University, P.O. Box 9504,2300 RA, Leiden, The Netherlands;

    Physics of Nanodevices, Zernike Institute for Advanced Materials, University ofGroningen, Nijenborgh 4,974% AG Groningen, The Netherlands;

    Physics of Nanodevices, Zernike Institute for Advanced Materials, University ofGroningen, Nijenborgh 4,974% AG Groningen, The Netherlands;

    Kamerlingh Onnes Laboratorium, Leiden University, P.O. Box 9504,2300 RA, Leiden, The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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