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首页> 外文期刊>Journal of Applied Physics >Optical properties of nanocrystalline silicon within silica gel monoliths
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Optical properties of nanocrystalline silicon within silica gel monoliths

机译：硅胶整体材料中纳米晶硅的光学性质

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Described herein is the incorporation of nanocrystalline silicon nc-Si from porous silicon (PSi) in a silica matrix fabricated by the sol-gel technique that yields highly photoluminescent (PL) and optically transparent monoliths with uniformly distributed nc-Si inclusions or nanoclusters. The sample monoliths were prepared with PSi-derived nanoclusters (PSi-n) with average diameters of 14-45 nm. Concentrated samples of PSi-n-exhibited blueshifted orange emission bands with maximum peaks between 600 and 750 nm with PL emission intensities ten times stronger than those of the original PSi, while diluted samples exhibited UV to blue (350-450 nm) emission bands. The PL quantum yield of the typical PSi-n monoliths was 44% higher than the native PSi. Light absorption measurements showed a linear response to laser powers before the saturation threshold at 80 mW. PL bleaching following 3 h of constant laser power exposure resulted in 90% reduction of the maximum initial PL. Mechanical and thermal stability properties of nc-Si were greatly improved within the silica matrix, demonstrating that PSi-n monoliths' are more manageable materials that enable the fabrication of samples with high densities of nc-Si for semiconducting and optoelectronic purposes. No special chemical passivation of the nc-Si surfaces was used in the preparation of the PSi-n monoliths. A strong relation between the optical properties of this nanophase material and the size distribution and concentration of nc-Si in the sample is demonstrated. (C) 2004 American Institute of Physics.
机译：本文描述的是通过溶胶-凝胶技术将二氧化硅从多孔硅（PSi）中掺入纳米晶硅nc-Si，该溶胶-凝胶技术可产生高度光致发光（PL）和具有透明分布的nc-Si夹杂物或纳米团簇的光学透明整料。用PSi衍生的纳米团簇（PSi-n）制备样品整料，平均直径为14-45 nm。浓缩的PSi-n展色的蓝移橙色发射带样品的最大峰在600至750 nm之间，PL发射强度是原始PSi的十倍，而稀释后的样品则显示出紫外至蓝色（350-450 nm）的发射带。典型的PSi-n整料的PL量子产率比天然PSi高44％。光吸收测量结果显示，在80 mW的饱和阈值之前，激光功率具有线性响应。持续暴露3小时后，PL漂白导致最大初始PL降低90％。二氧化硅基质中nc-Si的机械和热稳定性能得到了极大的改善，这表明PSi-n整料是更易于管理的材料，能够为半导体和光电用途制造具有高密度nc-Si的样品。在制备PSi-n整料时，没有对nc-Si表面进行特殊的化学钝化处理。证明了这种纳米相材料的光学性质与样品中nc-Si的尺寸分布和浓度之间的密切关系。 （C）2004美国物理研究所。

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