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首页> 外文期刊>Journal of Applied Physics >Impact of the non-planar morphology of pre-patterned substrates on the structural and electronic properties of embedded site-controlled InAs quantum dots
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Impact of the non-planar morphology of pre-patterned substrates on the structural and electronic properties of embedded site-controlled InAs quantum dots

机译:预图案化衬底的非平面形态对嵌入的位控InAs量子点的结构和电子性能的影响

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摘要

We present an experimental and theoretical analysis of the influence of a surface nanopattern on the properties of embedded InAs/GaAs quantum dots (QD). In particular, we analyze QDs grown on nanoimprint lithography (NIL) patterned grooves and investigate the influence of the non-planar surface morphology on the size, shape, strain distribution, and electronic structure of the embedded QDs. We show that the height reduction of InAs QDs during GaAs capping is significantly less pronounced for the QDs grown on the pattern than for the self-assembled QDs. Furthermore, the pattern has a strong impact on the strain and composition profile within the QD. The experimentally observed strain distribution was successfully reproduced with a three-dimensional model assuming an inverse-cone type composition gradient. Moreover, we show that the specific morphology of the QDs grown in the grooves gives rise to an increase of the vertically polarized photoluminescence emission which was explained by employing 8-band k.p calculations. Our findings emphasize that the surface curvature of the pattern not only determines the nucleation sites of the QDs but also has a strong impact on their morphological properties including shape, size, composition profile, and strain distribution. These properties are strongly cross-correlated and determine the electronic and optical characteristics of the QDs.
机译:我们提出了对表面纳米图案对嵌入式InAs / GaAs量子点(QD)性能的影响的实验和理论分析。特别是,我们分析了在纳米压印光刻(NIL)图案凹槽上生长的量子点,并研究了非平面表面形态对嵌入式量子点的尺寸,形状,应变分布和电子结构的影响。我们显示,在GaAs封盖过程中,InAs QD高度的降低对于图案上生长的QD明显不如自组装QD明显。此外,图案对量子点内的应变和成分分布有很大影响。实验中观察到的应变分布已成功地通过三维模型(假定反圆锥型成分梯度)得以再现。此外,我们表明在沟槽中生长的量子点的特定形态会导致垂直偏振光致发光发射的增加,这可以通过使用8波段k.p计算来解释。我们的发现强调,图案的表面曲率不仅决定了量子点的形核位置,而且对其形貌特性(包括形状,大小,成分分布和应变分布)也有很大的影响。这些特性之间具有很强的互相关性,并决定了量子点的电子和光学特性。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第17期|1-10|共10页
  • 作者单位

    Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101 Tampere, Finland|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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