首页> 外文期刊>Journal of Crystal Growth >Heteroepitaxial growth of alkali halide solid solution on GaAs(1 0 0)
【24h】

Heteroepitaxial growth of alkali halide solid solution on GaAs(1 0 0)

机译:GaAs(1 0 0)上卤化物碱溶液的异质外延生长

获取原文
获取原文并翻译 | 示例
           

摘要

Heteroepitaxial growth of alkali halide solid solution on GaAs(1 0 0) was studied using reflection high-energy electron diffraction, Auger electron spectroscopy, and electron energy loss spectroscopy. In past studies, a higher substrate temperature has been needed for the epitaxial growth of alkali halides on semiconductor substrates. We could grow a single-crystalline alkali halide thin film on a semiconductor substrate at room temperature, using a solid solution NaCl_0.94Br_0.06 whose lattice constant was equal to that of GaAs. We could modify the lattice constant of a solid solution by changing the mixing ratio, and controlling the conditions of epitaxial growth.
机译:利用反射高能电子衍射,俄歇电子能谱和电子能量损失能谱研究了卤化碱在GaAs(1 0 0)上的异质外延生长。在过去的研究中,在半导体衬底上外延生长碱金属卤化物需要更高的衬底温度。我们可以使用晶格常数等于GaAs的固溶NaCl_0.94Br_0.06在室温下在半导体衬底上生长单晶碱式卤化物薄膜。我们可以通过改变混合比并控制外延生长条件来改变固溶体的晶格常数。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号