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首页> 外文期刊>Journal of Crystal Growth >MBE growth of mid-infrared antimonide LEDs with strained electron barriers
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MBE growth of mid-infrared antimonide LEDs with strained electron barriers

机译:具有应变电子势垒的中红外锑LED的MBE生长

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摘要

InAs/InAs_xSb_1-x single quantum well (SQW) p-I-n structures have been grown on p~+-InAs(001) substrates by molecular-beam epitaxy. Significant improvements in SQW light emitting diode performance have been realized by the incorporation of strained electron barrier layers. Room temperature performance has increased by factor of up to 7. Additional 4 K magneto-electro-luminescence measurements demonstrate the good materials quality.
机译:InAs / InAs_xSb_1-x单量子阱(SQW)p-I-n结构通过分子束外延生长在p〜+ -InAs(001)衬底上。通过引入应变电子势垒层,已经实现了SQW发光二极管性能的显着改善。室温性能提高了多达7倍。另外的4 K磁电致发光测量证明了良好的材料质量。

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