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首页> 外文期刊>Journal of Crystal Growth >Highly p-typed superlattices consist of undoped InAs and carbon-doped GaAs layers
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Highly p-typed superlattices consist of undoped InAs and carbon-doped GaAs layers

机译:高度p型超晶格由未掺杂的InAs和碳掺杂的GaAs层组成

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摘要

The strained-layer-superlattice (SLS) consisting of undoped InAs and carbon-doped GaAs (CaAs:C) layers were successfully grown on InP substrates by LP-MOVPE The grown superlattice shows the p-type conductivity with a hole concentration of 1 x 10~(19) cm~(-3) and Hall mobility of 70 cm~2 V~(-1) s~(-1) at room temperature. The resistivity is low enough to be used as an electrically equivalent highly p-type InGaAs base layer of an InP/InGaAs heterojunction bipolar transistor (HBT). The High-Angle Annular Dark Field Scanning Transmission Electron Microscopy (HAADF STEM) images reveal that the InAs/ GaAs:C superlattice has an interface more abrupt than the undoped InAs/GaAs superlattice. It is attributed to the suppressed In diffusion from InAs to GaAs due to carbon doping in GaAs.
机译:通过LP-MOVPE在InP衬底上成功生长了由未掺杂InAs和碳掺杂GaAs(CaAs:C)层组成的应变层超晶格(SLS)。生长的超晶格显示p型电导率,空穴浓度为1 x在室温下为10〜(19)cm〜(-3),霍尔迁移率为70 cm〜2 V〜(-1)s〜(-1)。电阻率足够低,以用作InP / InGaAs异质结双极晶体管(HBT)的电气等效的高度p型InGaAs基极层。高角度环形暗场扫描透射电子显微镜(HAADF STEM)图像显示,InAs / GaAs:C超晶格的界面比未掺杂的InAs / GaAs超晶格更突变。这归因于由于GaAs中的碳掺杂而抑制了In从InAs到GaAs的扩散。

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  • 来源
    《Journal of Crystal Growth》 |2013年第1期|197-199|共3页
  • 作者单位

    Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;

    Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;

    Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;

    Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;

    Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. characterization; A1. interfaces; A3. low press. metalorganic vapor phase epitaxy; B1. semiconductingⅢ—Ⅴ materials; B3. bipolar transistor;

    机译:A1。表征;A1。接口;A3。低压力。金属有机气相外延;B1。半导体Ⅲ—Ⅴ材料;B3。双极晶体管;

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