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机译:高度p型超晶格由未掺杂的InAs和碳掺杂的GaAs层组成
Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;
Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;
Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;
Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;
Department of Engineering Science, Graduate School of Informatics and Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka,Chofil, Tokyo 182-8585, Japan;
A1. characterization; A1. interfaces; A3. low press. metalorganic vapor phase epitaxy; B1. semiconductingⅢ—Ⅴ materials; B3. bipolar transistor;
机译:短周期GaAs / InAs超晶格和InGaAs结合层覆盖的InAs量子点的光学特性
机译:金属有机气相外延法生长InAs衬底上砷掺入GaAsSb层厚度对InAs / GaAsSb超晶格的影响
机译:InAs / GaAs和GaP / GaAs异质结构和应变层状超晶格通过原子层外延生长机理的比较研究
机译:GaAsN单层和GaAsN / InAs / GaAs超晶格的光学常数,临界点,自由载流子效应和声子模式
机译:InAs / GaAs短周期应变层超晶格的分子束外延生长。
机译:通过在绝缘GaAs / AlGaAs量子阱的界面处插入超薄InAs层来调整Rashba / Dresselhaus自旋分裂
机译:在高频应用中,在成核量子点阈值以下和附近的InAs层厚度下,调制掺杂N-AlGaAs /(InAs / GaAs)/ GaAs超晶格的分子束外延
机译:分子束外延生长在Gaas衬底上的(Inas)m(Gaas)n短周期超晶格层的研究