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首页> 外文期刊>Journal of Crystal Growth >GalnAs/GaAsSb-based type-II micro-cavity LED with 2-3 xm light emission grown on InP substrate
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GalnAs/GaAsSb-based type-II micro-cavity LED with 2-3 xm light emission grown on InP substrate

机译:基于GalnAs / GaAsSb的II型微腔LED,在InP衬底上生长2-3 xm的光

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摘要

In this paper we present the epitaxial growth and characterization of an InP-based micro-cavity light emitting diode (LED) with up to 3 μm light emission by using GalnAs/CaAsSb-based type-II quantum wells. The LED was grown by LP-MOVPE and achieves emission from 2 μm to 3 μm at room-temperature. Furthermore a second LED with centered emission at 2.8 μm has been realized. Hence, the achievable long-wavelength electroluminescence emission with InP-based materials has been extended up to 3 μm.
机译:在本文中,我们通过使用基于GalnAs / CaAsSb的II型量子阱,介绍了InP基微腔发光二极管(LED)的外延生长和表征,该二极管具有高达3μm的发光。 LED是通过LP-MOVPE进行生长的,在室温下发光范围为2μm至3μm。此外,已经实现了中心发光为2.8μm的第二个LED。因此,基于InP的材料可实现的长波长电致发光发射已扩展至3μm。

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