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首页> 外文期刊>Journal of Crystal Growth >Structural properties of multi-stacked self-organized InGaAs quantum dots grown on GaAs (311)B substrate
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Structural properties of multi-stacked self-organized InGaAs quantum dots grown on GaAs (311)B substrate

机译:在GaAs(311)B衬底上生长的多堆叠自组织InGaAs量子点的结构特性

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摘要

We have investigated the structural properties of multi-stacked layers of self-organized In_(0.4)Ga_(0.6)As quantum dots (QDs) embedded with GaN0.007As0.993 strain compensation layers (SCLs) grown on GaAs (311)B substrate by atomic hydrogen-assisted molecular beam epitaxy. Symmetrical lens-shaped QDs are observed along [011], while their shape is asymmetric along [233] with two different dominant facets. Further, QDs are vertically aligned in the growth direction when viewed along [011], while the alignment is inclined at an angle of 22° with respect to the growth direction when viewed along [233]. The inclination angle is in good agreement with the result of resonant diffuse X-ray scattering sheets in reciprocal space mapping around GaAs (311) lattice point. We believe that the local strain field around QD extends further outward from the lower-angle facet, thereby the vertical alignment is tilted along the direction of stronger strain field.
机译:我们研究了在GaAs(311)B衬底上生长的,嵌入GaN0.007As0.993应变补偿层(SCL)的自组织In_(0.4)Ga_(0.6)As量子点(QD)的多层堆叠结构的性能通过原子氢辅助分子束外延。沿[011]观察到对称的透镜状QD,而沿[233]观察到它们的形状不对称,并具有两个不同的主导面。此外,当沿着[011]观察时,QD在生长方向上垂直对齐,而当沿着[233]观察时,相对于生长方向以22°的角度倾斜。倾斜角与围绕GaAs(311)晶格点的相互空间映射中的共振散射X射线散射片的结果非常吻合。我们认为,QD周围的局部应变场从下角小平面进一步向外延伸,从而使垂直方向沿较强的应变场方向倾斜。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第2期|226-230|共5页
  • 作者单位

    Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan;

    Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan School of Engineering, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan;

    Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan School of Engineering, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan;

    Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan School of Engineering, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Low-dimensional structures; A3. Molecular beam epitaxy; B2. Semiconducting III-V materials;

    机译:A1。低维结构;A3。分子束外延;B2。半导体III-V材料;

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