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机译:用于中红外二极管激光器的InP衬底上的InAs_yP_(1-y)变形缓冲层
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI 53706, USA;
rnDepartment of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI 53706, USA;
rnDepartment of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI 53706, USA;
rnDepartment of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI 53706, USA;
rnDepartment of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI 53706, USA;
rnDepartment of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI 53706, USA;
rnDepartment of Chemical and Biological Engineering, University of Wisconsin-Madison, USA;
rnDepartment of Mechanical & Aerospace Engineering, West Virginia University, USA;
rnDepartment of Materials Science and Engineering, University of Wisconsin-Madison, USA;
rnCode 5613, Naval Research Laboratory;
rnCode 5613, Naval Research Laboratory;
rnDepartment of Physics, University at Albany, Suny;
A3. Organometallic vapor phase epitaxy; A3. Quantum wells; B1. Antimonides; B1. Phosphides; B3. Laser diodes;
机译:InP衬底上的变质InAs_yP_(1-y)(y = 0.30-0.75)和Al_δIn_(1-δ)As_yP_(1-y)缓冲层
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机译:缓冲剂类型对InP(100)衬底上生长的In0.82Ga0.18As外延层的影响
机译:使用渐变InxGa1-xAs-InP变质缓冲层的GaAs衬底上的InAlAs太阳能电池
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