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首页> 外文期刊>Journal of Crystal Growth >Near band edge optical absorption and photoluminescence dynamics in bulk InAsN dilute-nitride materials
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Near band edge optical absorption and photoluminescence dynamics in bulk InAsN dilute-nitride materials

机译:块状InAsN稀氮化物材料中的近带边缘光吸收和光致发光动力学

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摘要

Dilute-nitride InAs bulk materials with up to 2.25% of nitrogen were grown by molecular beam epitaxy on InAs substrates. Photoluminescence (PL) and optical absorption measurements demonstrate a bandgap reduction by up to 150 meV with increasing nitrogen incorporation. Close correspondence of the energies of the photoluminescence peak and absorption edges indicate limited Moss-Burstein shift Minority carrier lifetimes in the nanosecond range are measured using an ultra-fast PL up-conversion technique for the samples with up to 2% of nitrogen. Orders of magnitude advance of the carrier relaxation lifetimes as compared to GaSbN encourage development of the InAsN as a potential material for mid-IR detector applications.
机译:通过分子束外延在InAs衬底上生长氮含量高达2.25%的稀氮化InAs块状材料。光致发光(PL)和光吸收测量结果表明,随着氮掺入量的增加,带隙降低了多达150 meV。光致发光峰和吸收边缘的能量紧密对应,表明有限的Moss-Burstein位移少数载流子寿命在纳秒范围内,是使用超快PL上转换技术对氮含量高达2%的样品进行测量的。与GaSbN相比,载流子弛豫寿命提高了几个数量级,这促使InAsN成为中红外探测器应用的潜在材料。

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