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In-situ observations of dissolution process of GaSb into InSb melt by X-ray penetration method

机译:用X射线穿透法原位观察GaSb在InSb熔体中的溶解过程

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摘要

Dissolution process of GaSb into InSb melt was observed by an X-ray penetration method. The intensity of X-rays penetrated through the rectangular shaped GaSb (seed)/InSb/GaSb (feed) sandwich sample was recorded by the CdTe line sensor detector. The penetrated X-ray intensities and images of the sample were obtained as a function of time and temperature. The gallium (Ga) composition profile of the sample was calculated as a function of time by making the calibration line with the penetrated X-ray intensities of GaSb and InSb standard samples. The calculated Ga composition profile of the grown sample agreed well with the data measured by energy dispersive X-ray spectroscopy analysis. The result suggested that lower GaSb seed dissolved faster than upper GaSb feed despite of the low temperature at the lower GaSb seed. It clearly indicates that the solutal transport induced by gravity strongly affects the dissolution process.
机译:用X射线穿透法观察了GaSb在InSb熔体中的溶解过程。通过CdTe线传感器检测器记录穿过矩形GaSb(种子)/ InSb / GaSb(进料)夹心样品的X射线强度。根据时间和温度获得穿透的X射线强度和样品图像。通过使校准线具有GaSb和InSb标准样品的X射线穿透强度,可以计算出样品的镓(Ga)成分随时间变化的函数。生长的样品的计算出的Ga组成曲线与通过能量色散X射线光谱分析法测量的数据非常吻合。结果表明,尽管较低GaSb种子的温度较低,但较低GaSb种子的溶解速度比较高GaSb饲料快。清楚地表明,重力引起的溶质运移强烈影响溶解过程。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第19期|p.2677-2682|共6页
  • 作者单位

    Research Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

    rnDepartment of Electrical Engineering, Shizuoka Institute of Science and Technology, Fukuroi, Shizuoka 437-8555, Japan;

    rnInstitute of Space and Astronautical Science, Japan Aerospace Exploration Agency, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 229-8510, Japan;

    rnResearch Institute of Electronics, Shizuoka University, Johoku 3-5-1, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Mass transfer; A2. Growth from solutions; B1. Gallium compounds; B2. Semiconducting III-V materials;

    机译:A1。传质;A2。解决方案的增长;B1。镓化合物;B2。半导体III-V材料;

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