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机译:CBr_4对非极性立方GaN的碳掺杂
Department of Physics, University of Paderborn, Warburger Strasse 100, 33098 Paderbom, Germany;
Department of Physics, University of Paderborn, Warburger Strasse 100, 33098 Paderbom, Germany;
Department of Physics, University of Paderborn, Warburger Strasse 100, 33098 Paderbom, Germany;
Department of Physics, University of Paderborn, Warburger Strasse 100, 33098 Paderbom, Germany;
Leibniz-lnstitut fuer Oberflaechenmodiflzierung e.V., Permoserstrasse 15, 04318 Leipzig, Germany;
University of Augsburg, Experimentalphysik IV, Universitatsstrasse 1 Nord, 86135 Augsburg, Germany;
Department of Physics, University of Paderborn, Warburger Strasse 100, 33098 Paderbom, Germany;
A1. Doping; A1. High-resolution X-ray diffraction; A3. Molecular beam epitaxy; B1. Nitrides; B2. Semiconducting gallium compounds;
机译:立方氮化铝微盘腔中非极性GaN量子点的激光特性
机译:DFT技术应用于掺碳共混锌(立方)GaN的研究
机译:有和没有碳掺杂的立方氮化镓的近带边光学特性
机译:MOVPE使用CBr_4生长的碳掺杂GaAs
机译:以极性,半极性和非极性方向生长的InGaN / GaN多量子阱发光二极管。
机译:关于碳掺杂GaN中供体/受体补偿比的建模在横向GaN功率Hemts中的单一再现击穿电压和电流塌陷
机译:Mn掺杂GaN极性和非极性表面的计算研究