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首页> 外文期刊>Journal of Crystal Growth >Ultra-thin and high-aspect-ratio TiN nanosheets
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Ultra-thin and high-aspect-ratio TiN nanosheets

机译：超薄高纵横比TiN纳米片

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Ultra-thin and high-aspect-ratio titanium nitride (TiN) nanosheets were successfully synthesized by a chemical vapor deposition method using TiCl_4 and N_2 as source materials without catalyst assistance. Nanosheet thickness was around 3.2 nm determined from atomic force microscopy (AFM) and electron energy-loss spectrometer (EELS) measurements. According to FESEM images, length of nanosheet ranged from 5 to 20 μm, indicating that the nanosheets had the high aspect ratio in the range between 1500 and 5500. Because of the extremely thin thickness, translucent TiN nanosheets were capable of exhibiting bending, folding, as well as rolling. The 1/3{220} and 1/3{422} forbidden reflections were observed in SAED patterns, confirmed by the observation of the threefold {422} lattice fringes in high-resolution transmission electron microscopy (HRTEM) image. The observed and possible minor phases such as TiSi_2, Si_3N_4 and titanium oxynitride probably resulted from the complex reactions involving TiCl_4, TiN and Si substrates.
机译：以TiCl_4和N_2为原料，无需催化剂辅助，通过化学气相沉积法成功合成了超薄高纵横比的氮化钛（TiN）纳米片。由原子力显微镜（AFM）和电子能量损失谱仪（EELS）测量确定的纳米片厚度约为3.2 nm。根据FESEM图像，纳米片的长度为5至20μm，这表明纳米片的纵横比较高，介于1500和5500之间。由于厚度极薄，半透明的TiN纳米片能够表现出弯曲，折叠，以及滚动。在SAED模式中观察到1/3 {220}和1/3 {422}禁止反射，这是通过在高分辨率透射电子显微镜（HRTEM）图像中观察到三重{422}晶格条纹而证实的。观察到的可能的次要相，例如TiSi_2，Si_3N_4和氮氧化钛，可能是由涉及TiCl_4，TiN和Si衬底的复杂反应引起的。

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