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首页> 外文期刊>Journal of Crystal Growth >Growth of La_2Ti_2O_7 and LaTiO_3 thin films using pulsed laser deposition
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Growth of La_2Ti_2O_7 and LaTiO_3 thin films using pulsed laser deposition

机译:脉冲激光沉积生长La_2Ti_2O_7和LaTiO_3薄膜

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摘要

The influence of substrate temperature, oxygen activity of the ambient gas, and substrate type on the growth morphology, phase selection, and epitaxy of thin films in the LaTiO_x (x ≈ 3.0 or 3.5) family were investigated. The films were deposited using pu
机译:研究了衬底温度,环境气体的氧气活性和衬底类型对LaTiO_x(x≈3.0或3.5)族薄膜的生长形态,相选择和外延生长的影响。薄膜使用pu沉积

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