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首页> 外文期刊>Journal of Crystal Growth >Surface reconstruction patterns of GaN grown by molecular beam epitaxy on GaN bulk crystals
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Surface reconstruction patterns of GaN grown by molecular beam epitaxy on GaN bulk crystals

机译:通过分子束外延在GaN块状晶体上生长的GaN的表面重构图案

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摘要

An investigation of the conditions giving rise to surface reconstruction for GaN grown by molecular beam epitaxy on (0 0 0 1) bulk GaN substratres has been carried out. The results of different surface reconstructions were investigated by supplying Ga and active nitrogen separately to GaN surfaces. A (2×2) reconstruction on (0 0 0 1)GaN substrates and for GaN layers grown on such substrates was observed. The (2×2) surface reconstruction is stable in the presence of an active nitrogen flux at high temperature, but it disappears on cooling the GaN sample below ~400 deg C.
机译:已经进行了对通过分子束外延在(0 0 0 1)块状GaN衬底上生长的GaN进行表面重构的条件的研究。通过分别向GaN表面提供Ga和活性氮来研究不同表面重建的结果。观察到在(0 0 0 1)GaN衬底上以及在这样的衬底上生长的GaN层的(2×2)重建。 (2×2)表面重建在高温下存在活性氮通量的情况下是稳定的,但在将GaN样品冷却至约400摄氏度以下时消失。

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