...
首页> 外文期刊>Journal of Crystal Growth >Estimation of band-gap energy of intrinsic InN from photoluminescence properties of undoped and Si-doped InN films grown by plasma-assisted molecular-beam epitaxy
【24h】

Estimation of band-gap energy of intrinsic InN from photoluminescence properties of undoped and Si-doped InN films grown by plasma-assisted molecular-beam epitaxy

机译:从通过等离子体辅助分子束外延生长的未掺杂和掺Si的InN薄膜的光致发光特性估算本征InN的带隙能

获取原文
获取原文并翻译 | 示例
           

摘要

InN films with electron densities of 1.6 x 10(18)-1.4 x 10(19) cm(-3) had photoluminescence (PL) properties with clear electron density dependencies. The PL peak shifted to a higher energy with increasing electron density, whereas PL intensity decreased with increasing electron density. These characteristics are typical of degenerate semiconductors with a large density of defects and/or dislocations. We estimated a band-gap energy of 0.6-0.65 eV for intrinsic InN from the shift in the PL peak position and band-gap shrinkage due to the conduction-band renormalization effect. (C) 2004 Elsevier B.V. All rights reserved.
机译:电子密度为1.6 x 10(18)-1.4 x 10(19)cm(-3)的InN薄膜具有光致发光(PL)特性,具有明确的电子密度依赖性。 PL峰随电子密度的增加而移向更高的能量,而PL强度随电子密度的增加而下降。这些特性是具有大量缺陷和/或位错密度的简并半导体的典型特征。我们根据PL峰位置的变化和由于导带重归一化效应引起的带隙收缩,估计出本征InN的带隙能量为0.6-0.65 eV。 (C)2004 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号