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首页> 外文期刊>Journal of Crystal Growth >Microstructure and residual stress in γ-LiAlO_2 layer fabricated by vapor transport equilibration on (11 2 0) sapphire
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Microstructure and residual stress in γ-LiAlO_2 layer fabricated by vapor transport equilibration on (11 2 0) sapphire

机译:(11 2 0)蓝宝石上通过气相输运平衡法制备的γ-LiAlO_2层的微观结构和残余应力

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γ-LiAlO_2 layers have been fabricated by vapor transport equilibration (VTE) technique on (1120) sapphire substrate. Microstructure of γ-LiAlO_2 layers is characterized by X-ray diffraction as functions of VTE treatment temperature and sapphire surface roughness, it has been found that the LiAlO_2 layers show a (200) preferred orientation. The effects of the VTE treatment temperature and sapphire surface roughness on the residual stress have been studied. The results show that residual stress in γ-LiAlO_2 layers varies from tension to compression with increasing VTE treatment temperature , but the thermal stress is compressive; the values of residual stress in γ-LiAlO_2 layers increase with the sapphire surface roughness.
机译:γ-LiAlO_2层是通过气相传输平衡(VTE)技术在(1120)蓝宝石衬底上制备的。 γ-LiAlO_2层的微观结构通过X射线衍射来表征,这是VTE处理温度和蓝宝石表面粗糙度的函数,发现LiAlO_2层表现出(200)较好的取向。研究了VTE处理温度和蓝宝石表面粗糙度对残余应力的影响。结果表明,随着VTE处理温度的升高,γ-LiAlO_2层的残余应力从拉伸到压缩变化,但热应力具有压缩性。 γ-LiAlO_2层中的残余应力值随着蓝宝石表面粗糙度的增加而增加。

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