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首页> 外文期刊>Journal of Crystal Growth >Island and pit kinetics on the growing GaAs (001) surface studied by synchrotron X-ray diffraction
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Island and pit kinetics on the growing GaAs (001) surface studied by synchrotron X-ray diffraction

机译:通过同步加速器X射线衍射研究生长的GaAs(001)表面上的岛和坑动力学

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摘要

Using a newly built dedicated synchrotron X-ray diffraction beamline, we investigate the growth and recovery kinetics during MBE of GaAs (001). The coarsening of two-dimensional islands and pits are analyzed quantitatively and independently of the surface reconstruction. Growth oscillations fits are joined to fits of the subsequent recovery. We identify the fast recovery process as the annihilation of islands and pits. The slow recovery process is due to the coarsening of the remaining islands or pits.
机译:使用新建的专用同步加速器X射线衍射光束线,我们研究了GaAs(001)MBE期间的生长和恢复动力学。定量分析二维岛和凹坑的粗化,并且与表面重建无关。将增长振荡拟合与后续恢复的拟合结合在一起。我们将快速恢复过程确定为as灭岛屿和坑洼。恢复速度缓慢是由于剩余的岛或凹坑变粗。

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