• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Imaging Science and Technology >Behavior of Ink Jet Printed Drops on a Corona-Treated Polymeric Film Substrate
【24h】

Behavior of Ink Jet Printed Drops on a Corona-Treated Polymeric Film Substrate

机译：喷墨印刷的液滴在电晕处理过的聚合物薄膜基材上的行为

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The effects of corona discharge treatment (CUT) on ink drop impact and spreading on a coated polypropylene film substrate were investigated. Substrate surface energies were determined from static contact angles with water and ethylene glycol. The polar com ponent increased with increasing CUT. Drops 39 μrn in diameter of an acrylate-based UV-curable ink were printed on to the substrate, and the spreading process studied by high-speed photography. No changes occurred during the initial stages, but the wetting phase was shorter for higher doses of CDT. Drops spread further on substrates with low doses of CDT than with higher doses. White light interferom etry was used to determine the final heights of drops after UV-curing. The height was significantly affected by CDT, with minimum height at low doses. The relationship was investigated between the static con tact angle for large sessile drops and the equilibrium contact angle for printed drops after spreading. Contact angle measurements with millimeter-sized sessile drops of ink provide a reliable method to determine the effects of corona treatment on wetting by ink jet printed drops.
机译：研究了电晕放电处理（CUT）对墨滴冲击和在聚丙烯涂层薄膜基材上铺展的影响。由与水和乙二醇的静态接触角确定基材表面能。极性组分随CUT的增加而增加。将基于丙烯酸酯的UV固化油墨直径为39μm的液滴印刷到基材上，并通过高速摄影研究其扩散过程。在初始阶段没有发生变化，但是对于较高剂量的CDT，润湿阶段较短。与高剂量相比，液滴在低剂量CDT上的分布更深。白光干涉法用于确定紫外线固化后液滴的最终高度。 CDT显着影响了身高，低剂量时身高最小。研究了无柄大液滴的静态接触角与散布后印刷液滴的平衡接触角之间的关系。毫米大小的无柄墨滴的接触角测量提供了一种可靠的方法，可以确定电晕处理对喷墨打印墨滴润湿的影响。

著录项

  • 来源
    《Journal of Imaging Science and Technology》 |2011年第5期|p.050606.1-050606.10|共10页
  • 作者

    Eleanor S. Betton; Wen-Kai Hsiao; Graham D. Martin; Ian M. Hutchings;

  • 作者单位

    University of Cambridge, Institute for Manufacturing, Cambridge CB3 OFS, United Kingdom;

    University of Cambridge, Institute for Manufacturing, Cambridge CB3 OFS, United Kingdom;

    University of Cambridge, Institute for Manufacturing, Cambridge CB3 OFS, United Kingdom;

    University of Cambridge, Institute for Manufacturing, Cambridge CB3 OFS, United Kingdom;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号