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首页> 外文期刊>Journal of Iron and Steel Research International >Oxidation Mechanism of Ni-0.5Y Microcrystal Coating Sputtered by Magnetron at 1000 deg C
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Oxidation Mechanism of Ni-0.5Y Microcrystal Coating Sputtered by Magnetron at 1000 deg C

机译:磁控溅射1000℃Ni-0.5Y微晶涂层的氧化机理

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摘要

The isothermal and cyclic oxidation behaviors of bulk pure nickel and its Ni-0. 5Y microcrystal coating sputtered by magnetron at 1 000 deg C in air were studied. The scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine the structures of the coating and the NiO oxide films. The laser Raman spectrum was also used to measure the stress level in NiO films formed on bulk nickel and the coating. It is found that the Ni-0.5Y microcrystal coating has lower oxidation rate, and the grain size of NiO formed on Ni-0.5Y coating is also relatively smaller than that formed on bulk nickel. Meanwhile, the compressive stress level of oxide film formed on Ni-0.5Y coating was lower than that formed on bulk nickel, and the high temperature plasticity of oxide film was much improved in coating case. The improvements of anti-oxidation properties of the sputtered Ni-0.5Y coating are due to the microcrystal structure and yttrium.
机译:块状纯镍及其Ni-0的等温和循环氧化行为。研究了磁控管在空气中1000℃溅射的5Y微晶涂层。扫描电子显微镜(SEM)和透射电子显微镜(TEM)用于检查涂层和NiO氧化膜的结构。激光拉曼光谱还用于测量在块状镍和涂层上形成的NiO膜中的应力水平。发现Ni-0.5Y微晶涂层具有较低的氧化速率,并且在Ni-0.5Y涂层上形成的NiO的晶粒尺寸也比在块状镍上形成的NiO的晶粒尺寸相对较小。同时,在Ni-0.5Y涂层上形成的氧化膜的压缩应力水平低于在块状镍上形成的氧化膜的压缩应力水平,并且在涂层情况下,氧化膜的高温可塑性得到了很大的提高。溅射的Ni-0.5Y涂层抗氧化性能的提高归因于微晶结构和钇。

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