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Carrier-selective contact GaP/Si solar cells grown by molecular beam epitaxy

机译:通过分子束外延生长的载流子选择性接触GaP / Si太阳能电池

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摘要

Integration of the III-V material systems on Si is an enabling technology for achieving high efficiency heterojunction Si-based photovoltaic devices. Gallium phosphide (GaP) offers numerous potential electrical, optical, and material advantages over amorphous silicon (a-Si) for the realization of several heterojunction solar cell designs. In this paper, details are given for the growth, fabrication, and characterization of different n-GaP-Si heterojunction solar cells to explore the effect of GaP as a carrier-selective contact. The cell performance is promising with high Si bulk lifetime (similar to 2.2 ms at the injection level of 10(15) cm(-3)) and an open-circuit voltage of 618 mV and an efficiency of 13.1% in this new solar cell design. In addition to GaP as an electron-selective contact, MoOx was successfully implemented as a hole-selective contact in the n-GaP-Si heterojunction solar cell, increasing efficiency to 14.1% by improving the short wavelength response. The Si bulk lifetime is maintained during growth of GaP on Si by two different approaches and their effects on GaP/Si solar cell performance are also presented.
机译:在Si上集成III-V材料系统是实现高效率异质结硅基光伏器件的一项使能技术。与非晶硅(a-Si)相比,磷化镓(GaP)具有许多潜在的电,光学和材料优势,可实现多种异质结太阳能电池设计。本文详细介绍了不同n-GaP / n-Si异质结太阳能电池的生长,制造和表征,以探索GaP作为载流子选择性接触的作用。这种新型太阳能电池具有很高的Si体寿命(在10(15)cm(-3)的注入水平下约为2.2 ms)和618 mV的开路电压以及13.1%的效率,有望实现电池性能设计。除了将GaP用作电子选择性接触外,MoOx还成功地用作n-GaP / n-Si异质结太阳能电池中的空穴选择性接触,通过改善短波长响应将效率提高到14.1%。通过两种不同的方法在GaP在Si上生长期间可以保持Si的体寿命,并且还介绍了它们对GaP / Si太阳能电池性能的影响。

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