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Oxidation behavior of vacuum plasma-sprayed hafnium-tantalum nitrides

机译：真空等离子喷涂ha钽氮化物的氧化行为

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摘要

A series of (HfN)_(1-x)(TaN)_x, ceramics with x representing the starting powder blend compositions of 0.0, 18.8, 28.1, and 46.7 at.%, have been fabricated by vacuum plasma spraying. During the plasma spraying, the mixture lost approximately 25 at.% nitrogen facilitating the precipitation of metallic and metal-rich nitride phases. These specimens underwent static air oxidation exposure up to 1700 ℃. In general, it was found that the addition of tantalum nitrides to the hafnium nitrides resulted in poorer oxidation behavior. However, the 18.8 at.% specimen deviated from this trend and had the lowest observed mass change. This specimen formed a dark-colored oxide scale, indexed as Hf_6Ta_2O_(17), which acted as a passivation layer. Within the scale, hafnium oxynitride phases were observed. A transformation pathway in forming these rhombohedral oxynitride phases is proposed by the filling in of oxygen in the light element interstitial locations of the rhombohedral ε-Hf_3N_2 and ζ-Hf_4N_3 structures.
机译：已经通过真空等离子喷涂制造了一系列（HfN）_（1-x）（TaN）_x陶瓷，其中x代表起始粉末混合物的成分为0.0、18.8、28.1和46.7 at。％。在等离子喷涂期间，混合物损失了约25 at。％的氮，促进了金属和富金属氮化物相的沉淀。这些样品经受了高达1700℃的静态空气氧化暴露。通常，发现将氮化钽添加到氮化ha中导致较差的氧化行为。但是，18.8 at。％的样品偏离了这种趋势，并且观察到的质量变化最低。该样品形成了深色的氧化皮，标为Hf_6Ta_2O_（17），用作钝化层。在该规模内，观察到氮氧化ha相。通过在菱形ε-Hf_3N_2和ζ-Hf_4N_3结构的轻元素间隙位置填充氧气，提出了形成这些菱形六面体氮氧化物相的转化途径。

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  • 来源
    《Journal of Materials Research》 |2015年第19期|2949-2957|共9页
  • 作者

    Bradford C. Schulz; Daniel Butts; Gregory B. Thompson;

  • 作者单位

    Department of Metallurgical & Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35487-0202, USA;

    Plasma Processes, LLC, Huntsville, Alabama 35811, USA;

    Department of Metallurgical & Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35487-0202, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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