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Synthesis and texturization processes of (super)-hydrophobic fluorinated surfaces by atmospheric plasma

机译：大气等离子体合成（超）疏水性氟化表面的过程

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摘要

The synthesis and texturization processes of fluorinated surfaces by means of atmospheric plasma are investigated and presented through an integrated study of both the plasma phase and the resulting material surface. Three methods enhancing the surface hydrophobicity up to the production of super-hydrophobic surfaces are evaluated: (ⅰ) the modification of a polytetrafluoroethylene (PTFE) surface, (ⅱ) the plasma deposition of fluorinated coatings and (ⅲ) the incorporation of nanoparticles into those fluorinated films. In all the approaches, the nature of the plasma gas appears to be a crucial parameter for the desired property. Although a higher etching of the PTFE surface can be obtained with a pure helium plasma, the texturization can only be created if O_2 is added to the plasma, which simultaneously decreases the total etching. The deposition of C_xF_y, films by a dielectric barrier discharge leads to hydrophobic coatings with water contact angles (WCAs) of 115°, but only the filamentary argon discharge induces higher WCAs. Finally, nanoparticles were deposited under the fluorinated layer to increase the surface roughness and therefore produce super-hydrophobic hybrid coatings characterized by the nonadherence of the water droplet at the surface.
机译：通过对等离子体相和所得材料表面的综合研究，研究并提出了利用大气等离子体对氟化表面进行合成和织构化的方法。评估了三种提高表面疏水性直至产生超疏水表面的方法：（ⅰ）改性聚四氟乙烯（PTFE）表面，（ⅱ）氟化涂层的等离子体沉积，以及（ⅲ）将纳米颗粒掺入其中氟化膜。在所有方法中，等离子气体的性质似乎是所需特性的关键参数。尽管可以使用纯氦等离子体对PTFE表面进行更高程度的蚀刻，但是只有在等离子体中添加O_2才能产生织构化，这同时降低了总蚀刻量。通过介电势垒放电沉积C_xF_y，膜会导致疏水涂层的水接触角（WCA）为115°，但是只有丝状氩气放电才会产生更高的WCA。最后，将纳米颗粒沉积在氟化层下以增加表面粗糙度，并因此产生特征在于水滴不粘附于表面的超疏水混合涂层。

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  • 来源
    《Journal of Materials Research》 |2015年第21期|3177-3191|共15页
  • 作者

    J. Hubert; J. Mertens; T. Dufour; N. Vandencasteele; F. Reniers; P. Viville; R. Lazzaroni; M. Raes; H. Terryn;

  • 作者单位

    Faculte des Sciences, Service de Chimie Analytique et de Chimie des Interfaces, Universite Libre de Bruxelles, CP-255, Bld du Triomphe, B-1050 Bruxelles, Belgium;

    Faculte des Sciences, Service de Chimie Analytique et de Chimie des Interfaces, Universite Libre de Bruxelles, CP-255, Bld du Triomphe, B-1050 Bruxelles, Belgium;

    Faculte des Sciences, Service de Chimie Analytique et de Chimie des Interfaces, Universite Libre de Bruxelles, CP-255, Bld du Triomphe, B-1050 Bruxelles, Belgium;

    Faculte des Sciences, Service de Chimie Analytique et de Chimie des Interfaces, Universite Libre de Bruxelles, CP-255, Bld du Triomphe, B-1050 Bruxelles, Belgium;

    Faculte des Sciences, Service de Chimie Analytique et de Chimie des Interfaces, Universite Libre de Bruxelles, CP-255, Bld du Triomphe, B-1050 Bruxelles, Belgium;

    Service de Chimie des Materiaux Nouveaux, Universite de Mons-UMONS/Materia Nova, 20 Place du Parc, 7000 Mons, Belgium;

    Service de Chimie des Materiaux Nouveaux, Universite de Mons-UMONS/Materia Nova, 20 Place du Parc, 7000 Mons, Belgium;

    Department of Metallurgy, Electrochemistry and Materials Science (SURF), Vrije Universiteit Brussel (VUB), Pleinlaan 2, B-1050 Brussel, Belgium;

    Department of Metallurgy, Electrochemistry and Materials Science (SURF), Vrije Universiteit Brussel (VUB), Pleinlaan 2, B-1050 Brussel, Belgium;

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