Strong visible light emission from silicon-oxycarbide nanowire arrays prepared by electron beam lithography and reactive ion etching

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• 来源
  《Journal of Materials Research》 |2015年第23期|3692-3699|共8页
• 作者

  Vasileios Nikas; Natasha Tabassum; Brian Ford; Lloyd Smith; Alain E. Kaloyeros; Spyros Gallis;

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• 作者单位

  Colleges of Nanoscale Sciences and Engineering, State University of New York Polytechnic Institute, Albany, New York 12203, USA;

  Colleges of Nanoscale Sciences and Engineering, State University of New York Polytechnic Institute, Albany, New York 12203, USA;

  Colleges of Nanoscale Sciences and Engineering, State University of New York Polytechnic Institute, Albany, New York 12203, USA;

  IBM Microelectronics, Semiconductor Research and Development Center, Hopewell Junction, New York 12533, USA;

  Colleges of Nanoscale Sciences and Engineering, State University of New York Polytechnic Institute, Albany, New York 12203, USA;

  Colleges of Nanoscale Sciences and Engineering, State University of New York Polytechnic Institute, Albany, New York 12203, USA;

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• 原文格式 PDF
• 正文语种 eng
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