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Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films

机译：溅射沉积氧化铂薄膜的热分解和分形特性

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摘要

Porous platinum thin films were prepared by thermal decomposition at temperatures from 25 to 675 ℃ of platinum oxide films deposited by a pulsed reactive sputtering technique. The samples' chemistry and structure were investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES), showing that the decomposition of the oxide begins as low as 400 ℃ and follows a sigmoidal trend with increasing annealing temperature. In the XRD spectra, only an amorphous-like signature was observed for temperatures below 575 ℃, while Pt 4f XPS showed that the deposited oxide was a mixture of PtO_2 and PtO. Pt-L_3 edge XANES and Pt 4f XPS spectra showed that the Pt concentration and electronic structure are predominant for temperatures equal to or above 575 ℃. The morphologies of the films were investigated by the area-perimeter method from atomic force microscopy and scanning electron microscopy (SEM) images, indicating that the surfaces exhibit a combination of Euclidian and fractal characteristics. Moreover, the thermal evolution of these characteristics indicates the agglomeration of the grains in the film as observed by SEM.
机译：通过脉冲反应溅射技术在25〜675℃温度下对氧化铂薄膜进行热分解制备多孔铂薄膜。通过X射线衍射（XRD），X射线光电子能谱（XPS）和X射线近边缘结构吸收（XANES）研究了样品的化学和结构，结果表明氧化物的分解开始于400并随着退火温度的升高呈S形趋势。在XRD光谱中，在575℃以下，仅观察到类似非晶态的特征，而Pt 4f XPS表明沉积的氧化物是PtO_2和PtO的混合物。 Pt-L_3边缘XANES和Pt 4f XPS光谱表明，当温度等于或高于575℃时，Pt浓度和电子结构是主要的。通过原子力显微镜和扫描电子显微镜（SEM）图像的面积-周长法研究了膜的形貌，表明表面表现出欧几里德和分形特征的组合。此外，这些特征的热演化表明，如通过SEM观察到的，膜中颗粒的团聚。

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  • 来源
    《Journal of Materials Research》 |2012年第5期|p.829-836|共8页
  • 作者

    Adolfo Mosquera; David Horwat; Luis Vazquez; Alejandro Gutierrez; Alexei Erko; Andre Anders; Joakim Andersson; Jose L. Endrino;

  • 作者单位

    Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas,E-28049 Madrid, Spain;

    Institut Jean Lamour, Ecole des Mines de Nancy, 54042 Nancy, France;

    Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas,E-28049 Madrid, Spain;

    Departamento de Fisica Aplicada and Instituto Nicolas Cabrera, Universidad Autdnoma de Madrid,E-28049 Madrid, Spain;

    Helmholtz-Zentrum Berlin fur Materialien und Energie GmbH, Elektronenspeicherring BESSY II,12489 Berlin, Germany;

    Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720;

    The Angstrom Laboratory, Uppsala University, S-75121 Uppsala, Sweden;

    Abengoa Research, Campus Palmas Altas, E-41014 Sevilla, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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