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首页> 外文期刊>Journal of Materials Research >Growth Of Epitaxial Films Of Sodium Potassium Tantalate And Niobate On Single-crystal Lanthanum Aluminate [100] Substrates
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Growth Of Epitaxial Films Of Sodium Potassium Tantalate And Niobate On Single-crystal Lanthanum Aluminate [100] Substrates

机译：单晶铝酸镧[100]衬底上钽酸钾和铌酸钠外延膜的生长

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摘要

Epitaxial films of sodium potassium tantalate (Na_(0.5)K_(0.5)TaO_3, NKT) and sodium potassium niobate (Na_(0.5)K_(0.5)TaO_3, NKN) were grown on single-crystal lanthanum aluminate (LAO) (100) (indexed as a pseudo-cubic unit cell) substrates via an all-alkoxide solution (methoxyethoxide complexes in 2-methoxyethanol) deposition route for the first time. X-ray diffraction studies indicated that the onset of crystallization in powders formed from hydrolyzed gel samples was 550 ℃. ~(13)C nuclear magnetic resonance studies of solutions of methoxyethoxide complexes indicated that mixed-metal species were formed, consistent with the low crystallization temperatures observed. Thermal gravimetric analysis with simultaneous mass spectrometry showed the facile loss of the ligand (methoxyethoxide) at temperatures below 400 ℃. Crystalline films were obtained at temperatures as low as 650 ℃ when annealed in air. θ-2θ x-ray diffraction patterns revealed that the films possessed c-axis alignment in that only (h00) reflections were observed. Pole-figures about the NKT or NKN (220) reflection indicated a single in-plane, cube-on-cube epitaxy. The quality of the films was estimated via ω (out-of-plane) and φ (in-plane) scans and full-widths at half-maximum (FWHMs) were found to be reasonably narrow (～1°), considering the lattice mismatch between the films and the substrate.
机译：在单晶铝酸镧（LAO）（100）上生长钽酸钾钠（Na_（0.5）K_（0.5）TaO_3，NKT）和铌酸钾钠（Na_（0.5）K_（0.5）TaO_3，NKN）的外延膜。首次通过全醇盐溶液（2-甲氧基乙醇中的甲氧基乙氧化物络合物）沉积路线沉积（称为伪立方晶胞）底物。 X射线衍射研究表明，由水解凝胶样品形成的粉末的结晶开始温度为550℃。甲氧乙氧基配合物溶液的〜（13）C核磁共振研究表明，形成了混合金属，这与观察到的低结晶温度一致。热重分析和同时质谱分析表明，在低于400℃的温度下，配体（甲氧基乙醇）的损失很小。在空气中退火时，可在低至650℃的温度下获得结晶膜。 θ-2θx射线衍射图表明该膜具有c轴排列，仅观察到（h00）反射。有关NKT或NKN（220）反射的极图表示单个面内，立方对立方外延。通过ω（面外）和φ（面内）扫描评估了薄膜的质量，考虑到晶格，发现半高全宽（FWHM）相当窄（〜1°）薄膜与基材之间的不匹配。

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