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Non-equilibrium microstructure and thermal stability of plasma-sprayed Al-Si coatings

机译:等离子喷涂Al-Si涂层的非平衡微观结构和热稳定性

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摘要

A splat-quenched, thick Al-Si deposit was manufactured by low-pressure plasma spraying (LPPS) and investigated in terms of microstructural inhomogeneity, Si solid solubility in alpha-Al, formation of metastable phases, and thermal stability. The LPPS Al-Si deposit had an inhomogeneous, layered microstructure consisting of splat-quenched lamellae and the incorporation of unmelted or partially melted particles. The splat-quenched Al-Si lamellae were formed by deposition of a fully liquid droplet and had an almost featureless microstructure at relatively low magnifications. There was a significant reduction in the alpha-Al lattice parameter in the LPPS Al-Si deposit because of extended Si solubility in the alpha-Al matrix. Transmission electron microscopy investigations showed that the splat quenching of liquid Al-Si droplet led to (i) columnar grain growth of alpha-Al(Si), (ii) formation of nano-sized Si precipitates in the Al matrix which was supersaturated with Si; and (iii) formation of amorphous Si phase embedded in the crystalline Al matrix. On reheating, the amorphous Si transformed into fine crystalline Si by interdiffusion of Al and Si atoms. Simultaneously, Si precipitation occurred in the supersaturated alpha-Al matrix. The overall activation energy for the Si crystallization/precipitation was estimated as similar to 81 kJ/mol from a modified Kissinger analysis.
机译:通过低压等离子喷涂(LPPS)制造了急冷淬火的厚Al-Si沉积物,并从微观结构不均匀性,Si在α-Al中的固溶度,亚稳相的形成和热稳定性方面进行了研究。 LPPS Al-Si沉积物具有不均匀的,分层的微观结构,该微观结构由快速淬火的薄片和未熔化或部分熔化的颗粒组成。急骤淬火的Al-Si薄片是由完全液滴的沉积形成的,并且在相对较低的放大倍数下几乎没有任何特征。 LPPS Al-Si沉积物中的α-Al晶格参数显着降低,因为硅在α-Al基体中的溶解度得到了扩展。透射电子显微镜研究表明,液态Al-Si液滴的飞溅淬火导致(i)α-Al(Si)的柱状晶粒生长,(ii)在Al基质中形成了Si的纳米级Si沉淀,形成了Si ; (iii)形成嵌入结晶Al基体中的非晶Si相。再次加热时,非晶硅通过Al和Si原子的相互扩散而转变为微晶Si。同时,Si沉淀发生在过饱和的Al-Al基体中。根据改进的基辛格分析,估计硅结晶/沉淀的总活化能类似于81 kJ / mol。

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