This study seeks to provide a mechanistic rationale for the substrate confinement effect on the strength and plasticity of thin metal films. Atomistic simulations of tensile loading of the freestanding and substrate-bonded films were carried out. Particular attention was devoted to correlating the overall mechanical response and the defect mechanisms on the atomic scale. The existence of an interface with the underlying substrate was observed to constrain significantly the dislocation motion in the film. The extent of film strengthening due to the substrate was dictated by the capability of atoms to slide along the interface. [References: 11]
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