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首页> 外文期刊>Journal of Materials Research >Relationships between the thermal stability, friction, and wear properties of reactively sputtered SiaC:H thin films
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Relationships between the thermal stability, friction, and wear properties of reactively sputtered SiaC:H thin films

机译：反应溅射SiaC：H薄膜的热稳定性，摩擦和磨损性能之间的关系

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摘要

The friction and wear performance were correlated with the thermal stability of reactively sputtered Si-aC:H thin films containing various Si and H concentrations. The average steady-state friction coefficients as measured by dry sliding pin-on-disk Tests decreased with increasing Si and H content. Furthermore, the films with high Si And H formed thick transfer films as compared to the films with little or no Si and H Content. Minimums in average ball abrasion rate and average film wear rate were Observed at the Si/C=0.10 film composition.
机译：摩擦和磨损性能与包含各种Si和H浓度的反应溅射Si-aC：H薄膜的热稳定性相关。通过干滑动销钉盘测试测得的平均稳态摩擦系数随Si和H含量的增加而降低。此外，与Si和H含量很少或没有Si和H含量的膜相比，具有高Si和H的膜形成厚的转移膜。在Si / C ＝ 0.10的膜组成下，观察到平均球磨损率和平均膜磨损率的最小值。

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