Electric properties of barium-strontium titanate thin films deposited by two-step radio-frequency sputtering

J. S. Fang; C. T. Chang; T. S. Chin

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Electric properties of barium-strontium titanate thin films deposited by two-step radio-frequency sputtering

机译：两步射频溅射沉积钛酸钡锶钛薄膜的电学性能

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Barium-strontium titanate (BST) thin films were prepared by a two-step deposition using radio-frequency magnetron sputtering on Pt/TiO_2-buffered Si(100) substrate. The initial BST layer thickness and intermediate annealing strongly affect the resultant Electric properties of the two-step BST thin films.

机译：通过在Pt / TiO_2缓冲的Si（100）衬底上使用射频磁控溅射通过两步沉积法制备钛酸锶钡（BST）薄膜。 BST的初始厚度和中间退火会严重影响两步BST薄膜的最终电学性能。

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《Journal of Materials Research》 |2001年第9期|p.2680-2686|共7页
作者
J. S. Fang; C. T. Chang; T. S. Chin;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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正文语种 eng
中图分类工程材料学;
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1. Properties of the Barium-Strontium Titanate Films Deposited onto the Silicon Substrate by rf Cathode Sputtering [J] . Shirokov V. B., Zinchenko S. P., Kiseleva L. I., Technical physics letters: Letters to the Russian journal of applied physics . 2018,第12期

机译：RF阴极溅射沉积在硅衬底上的钡 - 锶钛膜的性质
2. Electrical and optical properties of lanthanum-modified lead zirconate titanate thin films by radio-frequency magnetron sputtering [J] . W. J. Leng, C. R. Yang, H. Ji, Journal of Applied Physics . 2006,第10期

机译：射频磁控溅射镧改性锆钛酸铅钛酸酯薄膜的电学和光学性质
3. CHARACTERIZATION OF FERROELECTRIC AND PIEZOELECTRIC PROPERTIES OF LEAD TITANATE THIN FILMS DEPOSITED ON SI BY SPUTTERING [J] . Jaber B., Cattan E., Tronc P., Sensors and Actuators, A. Physical . 1997,第2期

机译：溅射表征沉积在Si上的钛铅薄膜的铁电和压电性质。
4. Dielectric properties of sol-gel derived barium-strontium titanate (Ba/sub 0.4/Sr/sub 0.6/TiO/sub 3/) thin film [C] . Lahiry, S., Gupta, . 1998

机译：溶胶凝胶衍生的钛酸钡锶锶（Ba / sub 0.4 / Sr / sub 0.6 / TiO / sub 3 /）薄膜的介电性能
5. Composition/structure/property relations of ferroelectric lead-lanthanum-titanate thin films deposited by multi-ion-beam reactive sputtering. [D] . Fox, Glen Richard. 1992

机译：通过多离子束反应溅射沉积的铁电钛酸铅镧薄膜的组成/结构/性质关系。
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Diffusion Behaviors and Electrical Properties in the In-Ga-Zn-O Thin Film Deposited by Radio-frequency Reactive Magnetron Sputtering [O] . Seok Ryeol Lee, Jae Ha Choi, Ho Seong Lee 2015

机译：通过射频反应磁控溅射沉积的Ga-Zn-O薄膜中的扩散行为和电性能
8. Electrical Properties of Thin GaAs Films Deposited by Sputtering. [R] . Soukup, R. J. 1979

机译：溅射沉积Gaas薄膜的电学特性。

Electric properties of barium-strontium titanate thin films deposited by two-step radio-frequency sputtering

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