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首页> 外文期刊>Journal of Materials Research >Mutually force microscopic studies of oxide thin films on organic self assembled monolayers
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Mutually force microscopic studies of oxide thin films on organic self assembled monolayers

机译：有机自组装单分子层上的氧化物薄膜的互力显微镜研究

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摘要

The surface morphology of TiO_2 and ZrO_2-based thin films, deposited from aqueous solution at 70-80 deg. C onto functionalized organic self assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO_2 (anatase) and of nanocrystalline tetragonal ZrO_2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.
机译：TiO_2和ZrO_2基薄膜的表面形貌在水溶液中70〜80度沉积。已经使用原子力显微镜（AFM）检查了在硅上官能化的有机自组装单层膜（SAMs）上的C。先前已证明该膜分别由纳米晶体TiO_2（锐钛矿）和纳米晶体四方ZrO_2与无定形碱性硫酸锆组成。该膜在两个长度尺度上表现出特征性的表面粗糙度。纳米级的粗糙度似乎由膜中微晶的尺寸决定。假定微米级的粗糙度与几个因素有关，包括SAM的形貌以及较大的，物理吸附的颗粒或附聚物的影响。纳米和微米尺度上的氧化物薄膜的形貌与膜生长的颗粒附着机制一致。

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