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首页> 外文期刊>Journal of materials science >Resistance switching behavior and ferroelectric properties of the Bi_(0.89)Ho_(0.08)Sr_(0.03)Fe_(0.97-x)Mn_(0.03)Zn_xO_3 thin films
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Resistance switching behavior and ferroelectric properties of the Bi_(0.89)Ho_(0.08)Sr_(0.03)Fe_(0.97-x)Mn_(0.03)Zn_xO_3 thin films

机译:Bi_(0.89)Ho_(0.08)Sr_(0.03)Fe_(0.97-x)Mn_(0.03)Zn_xO_3薄膜的电阻切换行为和铁电性能

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Bi~(0.89)Ho~(0.08)Sr~(0.03)Fe~(0.97− x )Mn~(0.03)Zn~( x )O~(3)(BHSFMZn~( x )O) thin films were prepared by a chemical solution deposition method on the fluorine doped tin oxide (FTO) substrates. The effects of Sr, Ho, Mn and Zn co-doping on the crystal structure, defects, leakage current, resistance switching behavior and ferroelectric properties of the BiFeO~(3)films were investigated. The results show that Zn_(2+)doped BHSFMO films lead to the transformation of the preferred orientation from (110) to (100). The oxygen vacancies, $${(Zn{prime _{Fe}} - V_{O}^{{ cdot cdot }})^ cdot },$$ ( Z n ′ F e - V O · · ) · , leakage current density and the Schottky barrier of BHSFMZn~( x )O films were increased with the increase of Zn_(2+)doping. The BHSFMZn~(0.04)O film shows the highest resistance switching ratio (18.6) at 200 kV/cm. The BHSFMZn~(0.01)O film have larger remanent polarization and switching current ( P ~( r )~ 135 µC/cm_(2)and I ~( S )~ 1.5 mA), and the relatively low coercive field and the polarization leakage current ( E ~( c )~ 350 kV/cm and I ~( L )~ 0.14 mA). Therefore, the resistance switching behavior or ferroelectric properties can be obtained by controlling the doping amount of Zn_(2+).
机译:制备Bi(0.89)Ho〜(0.08)Sr〜(0.03)Fe〜(0.97-x)Mn〜(0.03)Zn〜(x)O〜(3)(BHSFMZn〜(x)O)薄膜化学方法在氟掺杂氧化锡(FTO)衬底上的沉积方法。研究了Sr,Ho,Mn和Zn共掺杂对BiFeO〜(3)薄膜晶体结构,缺陷,漏电流,电阻转换行为和铁电性能的影响。结果表明,掺杂Zn_(2+)的BHSFMO薄膜导致优选取向从(110)转变为(100)。氧空位$$ {(Zn { prime _ {Fe}}-V_ {O} ^ {{ cdot cdot}})^ cdot},$$(Z n'F e-随着Zn_(2+)掺杂的增加,BHSFMZn〜(x)O薄膜的VO··)·泄漏电流密度和肖特基势垒均增加。 BHSFMZn〜(0.04)O膜在200kV / cm处显示出最高的电阻开关比(18.6)。 BHSFMZn〜(0.01)O薄膜具有更大的剩余极化和开关电流(P〜(r)〜135 µC / cm_(2)和I〜(S)〜1.5mA),并且矫顽场和极化泄漏相对较低。电流(E〜(c)〜350 kV / cm和I〜(L)〜0.14 mA)。因此,可以通过控制Zn_(2+)的掺杂量来获得电阻切换行为或铁电特性。

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