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首页> 外文期刊>Journal of materials science >Effect of annealing temperature on the structural, optical, magnetic and electrochemical properties of NiO thin films prepared by sol-gel spin coating
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Effect of annealing temperature on the structural, optical, magnetic and electrochemical properties of NiO thin films prepared by sol-gel spin coating

机译：通过溶胶 - 凝胶旋转涂层制备的NiO薄膜结构，光学，磁性和电化学性能的影响

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摘要

The effect of annealing temperature on the structural, morphological, optical, magnetic and electrochemical properties of spin coated NiO thin films were studied. The XRD analysis shows that all the annealed NiO thin films are cubic structure with (200) preferred orientation. The XPS spectrum indicates that the main peak and satellite peaks of Ni (2P) and O (IS) show the presence of Ni~(2+) cation and O_2~ anions. Raman spectra show (IP) 1LO and (2P) 2LO modes for annealed NiO thin films. The SEM result shows that, increase in annealing temperature increases the grain size. UV-Visible spectrum exhibits high transmittance for annealed NiO thin films. The band gap energy decreases from 3.72 to 2.89 eV with increasing annealing temperature. The room temperature PL spectrum of NiO thin film has blue and violet emission in addition to UV emission. VSM studies revealed that a weak ferromagnetic behavior has shown by films annealed upto 400 °C and thereafter the magnetic behavior changes to paramagnetic nature. The NiO thin film annealed at 600 °C shows high specific capacitance by cyclic voltammetry analysis. Equivalent series resistance of NiO thin films were measured using electrochemical impedance spectrum and it decreases with increasing annealing temperature.
机译：研究了退火温度对旋涂的NiO薄膜的结构，形态，光学，磁性和电化学性能的影响。 XRD分析表明，所有退火的NIO薄膜是具有（200）优选取向的立方结构。 XPS光谱表明Ni（2P）和O（IS）的主峰和卫星峰显示Ni〜（2+）阳离子和O_2〜阴离子的存在。拉曼光谱显示（IP）1LO和（2P）2LO用于退火NIO薄膜的2LO模式。 SEM结果表明，退火温度的增加会增加晶粒尺寸。 UV可见光谱对退火的NIO薄膜表现出高透射率。带隙能量从3.72升至2.89eV随着退火温度的增加而降低。除UV排放外，NiO薄膜的室温Pl光谱还具有蓝色和紫色的排放。 VSM研究表明，薄膜弱的铁磁性行为由高达400°C退火，然后磁性行为变为顺磁性性质。在600℃下退火的NiO薄膜通过循环伏安法分析显示出高比电容。使用电化学阻抗光谱测量NiO薄膜的等效串联电阻，并且随着退火温度的增加而降低。

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  • 来源
    《Journal of materials science》 |2020年第19期|16634-16648|共15页
  • 作者

    N. R. Aswathy; Jiji Varghese; R.Vinodkumar;

  • 作者单位

    Department of Physics University College University of Kerala Thiruvananthapuram Kerala 695034 India;

    Department of Physics University College University of Kerala Thiruvananthapuram Kerala 695034 India;

    Department of Physics University College University of Kerala Thiruvananthapuram Kerala 695034 India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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