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Effect of Solution Concentration on ZnO/ZnAl_2O_4 Nanocomposite Thin Films Formation Deposited by Ultrasonic Spray Pyrolysis on Glass and Si(111) Substrates

机译:溶液浓度对玻璃和Si(111)衬底上超声波喷雾热解沉积的ZnO / ZNAL_2O_4纳米复合薄膜形成的影响

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摘要

A complex ZnO/ZnAl2O4 heterostructures thin films on glass and Si(111) substrates have been successively obtained by a soft ultrasonic spray pyrolysis (USP) method deposition using the Zn/Al molar ratios concentrations of 0.07/0.13 and 0.1/0.1, respectively. According to (XRD) an ordered zinc oxide (ZnO) and zinc aluminate (ZnAl2O4) structures deposited onto glass from the air annealing at 500 degrees C during 2 hours was observed and confirmed by the (EDX), (FTIR) and Raman spectroscopy techniques. The estimated crystallites size and stress values of ZnO and ZnAl2O4 in the ZnO/ZnAl2O4/glass film were 19 nm/0.469 GPa and 11 nm/-0.292 GPa, respectively. The lower Zn/Al molar ratio around 0.035/0.06 produced only ZnO as a single phase, suggesting the Al insufficient quantity. The Si(100) substrate with 0.07 Zn molarity conducted to the Zn2SiO4/ZnO/ZnAl2O4 composite. The Raman integrated intensity bands of ZnO and ZnAl2O4 increases with increasing Zn to Al molar ratio (0.1/0.1 comparatively to 0.07/0.13). The ZnO&ZnAl2O4 crystallinity enhances as Zn molarity increases. The ZnO films in the composites grow with (002) texture. The TC(hkl) value indicated that ZnAl2O4 in the ZnO/ZnAl2O4/glass layer is polycrystalline preferentially oriented along the (311) plane. Spinel ZnAl2O4 oxide onto Si(111) substrate grown according to the (220) orientation. Crystallites are larger in ZnO/ZnAl2O4/Si than in ZnO/ZnAl2O4/glass. The ZnO/ZnAl2O4 film onto glass substrate is transparent in the visible and near infrared regions and sensitive to UV absorption, as characterized by UV-Vis spectroscopy. The ZnO and ZnAl2O4 Eg values in the ZnO/ZnAl2O4/glass composite were 3.25 and 3.88 eV, respectively.
机译:通过使用0.07 / 0.13和0.1 / 0.1的Zn / Al摩尔比浓度分别通过0.07 / 0.13和0.1 / 0.1的Zn / Al摩尔比率沉积,玻璃和Si(111)衬底上的复合ZnO / Znal2O4异质结构薄膜依次获得。根据(XRD)根据(EDX),(FTIR),(FTIR)和拉曼光谱技术,观察到沉积在500℃下的空气退火到玻璃上的有序氧化锌(ZnO)和氧化锌(ZNAL2O4)结构。(FTIR)和拉曼光谱技术。 ZnO / Znal2O4 /玻璃膜中ZnO和Znal2O4的估计的微晶尺寸和应力值分别为19nm / 0.469gPa和11nm / -0.292gPa。较低的Zn / Al摩尔比仅为0.035 / 0.06仅产生ZnO作为单相,表明数量不足。具有0.07 ZN摩尔的Si(100)底物,其传导至Zn2SiO4 / ZnO / ZnO / ZNAL2O4复合材料。 ZnO和ZNAL2O4的拉曼集成强度带随着Zn至Al摩尔比的增加而增加(比较为0.07 / 0.13)。随着Zn摩尔性增加,ZnO和Znal2O4结晶度增加。复合材料中的ZnO膜随(002)纹理而生长。 TC(HKL)值表明ZnO / Znal2O4 /玻璃层中的Znal2O4优先沿(311)平面取向的多晶硅。尖晶石ZNAL2O4氧化物到Si(111)基底上,根据(220)取向生长。微晶在ZnO / ZNAL2O4 / Si中比ZnO / Znal2O4 /玻璃更大。 ZnO / Znal2O4膜在玻璃基板上在可见和近红外区域透明,并且对UV吸收敏感,如UV-Vis光谱。 ZnO和Znal2O4例如ZnO / Znal2O4 /玻璃复合材料中的值分别为3.25和3.88eV。

著录项

  • 来源
    《Journal of nano research》 |2020年第2020期|10-30|共21页
  • 作者单位

    Univ Abbes Laghrour Fac Sci & Technol Lab Struct Proprieties & Inter Atom Interact LASP Khenchela 40000 Algeria;

    Univ Constantine 1 Dept Elect Lab Microsyst & Instrumentat Route dAin El Bey Constantine 25000 Algeria;

    Univ Paris Saclay Sorbonne Univ Univ Paris Sud GeePs Grp Elect Engn Paris CNRS Cent Supelec 3 & 11 Rue Joliot Curie Plateau Moulon 91192 F-91192 Gif Sur Yvette France;

    Univ Abbes Laghrour Fac Sci & Technol Lab Struct Proprieties & Inter Atom Interact LASP Khenchela 40000 Algeria;

    Constantine 1 Univ Res Unit Mat Sci & Applicat BP 75 A Nouvelle Ville RP Constantine 25000 Algeria|Natl Polytech Inst Constantine Mat Engn Dept BP 75 A Nouvelle Ville RP Constantine 25000 Algeria;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ZnO_ZnAl2O4 thin film; molarities; Si(111); Si(100); glass substrate; XRD; Raman spectroscopy; Zn2SiO4; USP;

    机译:ZnO_Znal2O4薄膜;摩尔;Si(111);Si(100);玻璃基板;XRD;拉曼光谱;ZN2SIO4;USP;

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