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首页> 外文期刊>Journal of nano research >Antireflective Coatings with Nanostructured TiO_2 Thin Films for Silicon Solar Cells
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Antireflective Coatings with Nanostructured TiO_2 Thin Films for Silicon Solar Cells

机译：纳米结构的TiO_2薄膜用于硅太阳能电池的减反射膜

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摘要

This paper presents the preparation and characterization of nanostructured TiO_2 films designated to the integration of antireflective (AR) layers into the fabrication process of the silicon solar cells. The nanostructured titanium dioxide (TiO_2) layers have been obtained by the anodization of the Ti layer deposited by sputtering technique on glass substrates and silicon wafers. The obtained TiO_2 films were optically characterized using the Spectroscopic Ellipsometry (SE) and the values of the refractive index are in a range of 1.66-1.76 at 632 nm radiation wavelength. The transmittance of 90 nm TiO_2 thin films deposited on transparent substrate, evaluated by the spectrophotometry method, is over 70%. The TiO_2 band gap of 3.3 eV was evaluated from the spectral transmittance characteristic. Silicon solar cells with various AR coatings of TiO_2, SiO_2 and SiO_2 - TiO_2 have been fabricated. The optoelectrical characterization proved that the output maximum power (P_(max)) for the solar cell with a 90 nm TiO_2 layer is with 28% greater than P_(max) for the solar cells with SiO_2 as AR layer and with 15.5 % greater than P_(max) for the solar cells having a two-layer antireflective coating of SiO_2 - TiO_2.
机译：本文介绍了纳米结构的TiO_2薄膜的制备和表征，该薄膜用于将减反射（AR）层集成到硅太阳能电池的制造过程中。纳米结构的二氧化钛（TiO_2）层是通过对通过溅射技术沉积在玻璃基板和硅片上的Ti层进行阳极氧化而获得的。使用光谱椭偏仪（SE）对获得的TiO_2膜进行光学表征，并且在632nm的辐射波长下，折射率的值在1.66-1.76的范围内。通过分光光度法评估，沉积在透明基板上的90 nm TiO_2薄膜的透射率超过70％。由光谱透射率特性评价了3.3eV的TiO 2带隙。制备了具有各种TiO_2，SiO_2和SiO_2-TiO_2的AR涂层的硅太阳能电池。光电特性证明，具有90 nm TiO_2层的太阳能电池的最大输出功率（P_（max））比具有SiO_2作为AR层的太阳能电池的P_（max）大28％，并且比SiO_2作为AR层的太阳能电池的最大功率大具有两层SiO_2-TiO_2减反射涂层的太阳能电池的P_（max）。

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  • 来源
    《Journal of nano research》 |2013年第2013期|89-94|共6页
  • 作者

    Elena Manea; Catalin Comeliu Parvulescu; Munizer Purica; Elena Budianu; Florin Comanescu;

  • 作者单位

    National Institute for Research and Development in Microtechnologies, IMT-Bucharest, P.O. BOX 38-160, 023573 Bucharest, Romania;

    National Institute for Research and Development in Microtechnologies, IMT-Bucharest, P.O. BOX 38-160, 023573 Bucharest, Romania;

    National Institute for Research and Development in Microtechnologies, IMT-Bucharest, P.O. BOX 38-160, 023573 Bucharest, Romania;

    National Institute for Research and Development in Microtechnologies, IMT-Bucharest, P.O. BOX 38-160, 023573 Bucharest, Romania;

    National Institute for Research and Development in Microtechnologies, IMT-Bucharest, P.O. BOX 38-160, 023573 Bucharest, Romania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    antireflective films; TiO_2; ti anodization; solar cell;

    机译：防反射膜;TiO_2;钛阳极氧化;太阳能电池;

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