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首页> 外文期刊>Journal of nano research >Effect of Zinc Oxide Films on Si Substrates Growth by Microwave Plasma Jet Sintering System
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Effect of Zinc Oxide Films on Si Substrates Growth by Microwave Plasma Jet Sintering System

机译：微波等离子体射流烧结氧化锌膜对Si衬底生长的影响

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摘要

Microwave plasma techniques offered many advantages over conventional fabricating methods. However, few studies have used microwave plasma energy to sinter traditional ceramics. Thus, the aim of this work is microwave plasma Jet sintering system (MPJSS) and simulate analyze the electric field of ZnO films on Si (100) substrates. Ansoft HFSS consists of MPJSS modules for the calculation of ZnO films electromagnetic field. Sinter of ZnO films occurs at approximately N_2 with a 10 sccm gas flow rate for a process pressure of 35 Torr and several power of 300W, 600W, 900W and 1200W applied power. Optical emission spectroscopic (OES) studies of N_2 microwave plasmas, X-ray diffraction (XRD), Micro-Raman, and FESEM spectrometry were used to characterize the produced ZnO films. The results of XRD and Micro-Raman showed that the synthesized ZnO films had a high crystalline wurzite structure. The Zn_2SiO_4 peaks reveal an increase of the crystals dimensions with the increase of the E-field. Intensity of diffraction peak of ZnO films increases with increasing microwave powers in MPJSS.
机译：微波等离子体技术比常规制造方法具有许多优势。但是，很少有研究使用微波等离子体能量来烧结传统陶瓷。因此，这项工作的目的是微波等离子体喷射烧结系统（MPJSS），并模拟分析Si（100）衬底上ZnO薄膜的电场。 Ansoft HFSS由MPJSS模块组成，用于计算ZnO薄膜电磁场。 ZnO膜的烧结发生在Nsc约为10sccm的气体流量下，工艺压力为35 Torr，施加的功率分别为300W，600W，900W和1200W。 N_2微波等离子体的发射光谱（OES）研究，X射线衍射（XRD），显微拉曼光谱和FESEM光谱用于表征制备的ZnO薄膜。 XRD和Micro-Raman的结果表明，合成的ZnO薄膜具有较高的纤锌矿结构。 Zn_2SiO_4的峰揭示了随着电场的增加晶体尺寸的增加。随着微波功率的增加，ZnO薄膜的衍射峰强度增加。

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  • 来源
    《Journal of nano research》 |2013年第2013期|1-8|共8页
  • 作者

    Chun-Hsi Su; Chia-Min Huang;

  • 作者单位

    Graduate Institute of Mechanical & Electrical Technology, National Taipei University of Technology, 1, Sec. 3, Chung-hsiao E. Rd., Taipei,10608,Taiwan, R.O.C. Taiwan;

    Graduate Institute of Mechanical & Electrical Technology, National Taipei University of Technology, 1, Sec. 3, Chung-hsiao E. Rd., Taipei,10608,Taiwan, R.O.C. Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    Microwave plasma; Zinc Oxide; Sintering;

    机译：微波等离子体氧化锌烧结;

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