ULTRA FAST LASER-INDUCED ELASTODYNAMICS IN SINGLE CRYSTALLINE SILICON PART II: NEAR-FIELD RESPONSE

著录项

• 来源
  《Journal of thermal stresses》 |2009年第5期|494-511|共18页
• 作者

  Xuele Qi; C. Steve Suh;

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• 作者单位

  Mechanical Engineering Department, Texas A&M University, College Station, Texas, USA;

  Photomechanics Lab, Mechanical Engineering Department, Texas A&M University, College Station, TX 77843-3123, USA;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  axisymmetric model; multi-time scale; near-field response; silicon wafer; staggered finite difference scheme; ultrafast laser pulse;

  机译：轴对称模型多时间刻度;近场响应硅片交错有限差分方案;超快激光脉冲;