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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structure >Simple magnetic focusing for an electron gun based on a microtip array
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Simple magnetic focusing for an electron gun based on a microtip array

机译：基于微尖端阵列的电子枪的简单磁聚焦

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摘要

In this article, we propose a compact 10-20 keV electron gun based on a simple magnetic focusing of a dense array of field-emissive microtips. The properties of this magnetic focusing system have been investigated with the view to providing a homogeneous electron beam on a target with a predefined cross section (10 μm X 1 mm). The gun focusing performance has been estimated through an analytical calculation based on aberration optics. Because of the large aperture angle of the microtips, the system magnification is mainly due to spherical aberrations. Then, with an experimental setup immersed in a 0.046 T uniform magnetic field, an 80 μm X 1 mm beam spot was obtained on a 5.5 kV-biased anode from a 10μm X 1 mm microtip array, located 15 mm from the anode. The 0.6 mA peak emitted current brought the power density to 4 kW/cm~2, with a spot size larger than expected from the calculations. An adjustable magnetic field setup has made it possible to get a good understanding of the focusing mechanism. The limited focusing performance obtained in this experiment was attributed to the electric-field nonuniformity inside the vacuum chamber.
机译：在本文中，我们提出了一种紧凑的10-20 keV电子枪，该电子枪基于密集的场发射微尖端阵列的简单磁聚焦。为了在具有预定横截面（10μmX 1 mm）的目标上提供均匀的电子束，已经研究了该磁聚焦系统的特性。通过基于像差光学系统的分析计算可以估算出枪的聚焦性能。由于微尖的大孔径角，系统放大倍数主要归因于球差。然后，通过将实验装置浸入0.046 T均匀磁场中，在距阳极15 mm的10μmX 1 mm微尖端阵列上，在5.5 kV偏压的阳极上获得80μmX 1 mm的束斑。 0.6 mA的峰值发射电流使功率密度达到4 kW / cm〜2，光点尺寸大于计算结果。可调的磁场设置使您可以很好地了解聚焦机制。在该实验中获得的有限的聚焦性能归因于真空室内部的电场不均匀。

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