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首页> 外文期刊>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures >Revealing real images of cloverleaf pattern emission sites by using field ion microscopy
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Revealing real images of cloverleaf pattern emission sites by using field ion microscopy

机译：使用场离子显微镜显示苜蓿叶图案发射部位的真实图像

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The authors have attempted to reveal the origins of the characteristic cloverleaf patterns that often emerge in field emission microscopy studies from various organic materials. These phenomena were first reported by Müller [Z. Naturforsch. 59a, 473 (1950)], and many theories for their propagation have been proposed. However, their formation mechanism is still not completely understood because “real” images of the emission sites where the patterns are formed still remain unclear. In this article, the authors describe how images of the emission sites can be clarified by using field ion microscopy. Pentacene, copper phthalocyanine, and graphite nanoneedles were adopted as promising materials that might develop cloverleaf patterns. The results clarified that the emission sites were also cloverleaf shaped, including two- and four-lobed patterns. Important information revealing how the cloverleaf patterns are formed is presented in this article.
机译：作者试图揭示各种有机材料在场发射显微镜研究中经常出现的特征苜蓿叶形图案的起源。这些现象最早是由Müller[Z. Naturforsch。 59a，473（1950）]，并提出了许多有关其传播的理论。然而，由于形成图案的发射位置的“真实”图像仍然不清楚，因此它们的形成机理仍未完全理解。在本文中，作者描述了如何通过使用场离子显微镜来澄清发射位点的图像。并五苯，酞菁铜和石墨纳米针被用作有希望的材料，可能会形成苜蓿叶的图案。结果表明，发射位点也为苜蓿叶形，包括两叶和四叶模式。本文介绍了揭示三叶草图案形成方式的重要信息。

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