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PREFACE

机译:前言

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摘要

The International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology, and Modeling (INSIGHT 2007) succeeds the International Workshop on the Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, which had been held biennially since 1993. INSIGHT was held in Napa Valley, California from May 6 to 9, 2007. The meeting had near record attendance of well over 100 people and featured 78 invited and contributed papers. Thirty-one of those papers are published here. The Workshop Technical Chair was Wilfried Vandervorst of IMEC, the European Chair was Erik Collart of Applied Materials, the Asian Chair was Bunji Mizuno of UJTlab/UJT Inc., and the Publication Chair was Joseph Kopanski of the National Institute of Standards and Technology. Invited speakers in the plenary session featured Hans-Joachim Gossmann of Varian Semiconductor Equipment Associates, Inc., Kevin Jones of the University of Florida, Christoph Zechner of Synopsis, Inc., and Simone Severi.
机译:半导体器件制造,计量和建模方面的INSIGHT国际研讨会(INSIGHT 2007)是自1993年以来每两年举行一次的半导体超薄掺杂轮廓的制造,特性和建模国际研讨会的继任。该会议于2007年5月6日至9日在加利福尼亚州纳帕谷举行。该会议的出席人数接近创纪录的100余人,特色是78篇邀请和发表的论文。这些论文中有31篇发表在这里。研讨会的技术主席是IMEC的Wilfried Vandervorst,欧洲的主席是应用材料的Erik Collart,亚洲的主席是UJTlab / UJT Inc.的Bunji Mizuno,出版物的主席是美国国家标准与技术研究院的Joseph Kopanski。全体会议的邀请演讲嘉宾包括瓦里安半导体设备协会有限公司的Hans-Joachim Gossmann,佛罗里达大学的Kevin Jones,Synopsis公司的Christoph Zechner和Simone Severi。

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