...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Enhanced stitching for the fabrication of photonic structures by electron beam lithography
【24h】

Enhanced stitching for the fabrication of photonic structures by electron beam lithography

机译：通过电子束光刻技术制造光子结构的增强拼接

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Large-area electron beam lithography tools pattern substrates as a series of writing fields that are stitched together. Pattern defects, termed stitching errors, can arise at field boundaries and these can have detrimental effects on device performance. These problems are exaggerated by substrate tilt. In this article, the authors demonstrate the application of a substrate tilt correction procedure to minimize stitching errors in the fabrication of photonic structures by electron beam lithography. The authors show that the magnitude of stitching errors is dependent on the position within the field boundary and is influenced by substrate tilt. Application of tilt correction procedures is shown to reduce stitching errors and give rise to a corresponding reduction in propagation losses in photonic wire waveguides. The authors show that the results of measured propagation losses arising from stitching errors are in good agreement with numerical results.
机译：大面积电子束光刻工具将基板图案化为一系列缝合在一起的写入场。图案缺陷（称为缝合错误）可能会出现在场边界处，并且可能会对器件性能产生不利影响。这些问题由于基板倾斜而加剧。在本文中，作者演示了基板倾斜校正程序的应用，以最大程度地减小通过电子束光刻制造光子结构时的缝合误差。作者表明，缝合误差的大小取决于场边界内的位置，并受基板倾斜的影响。示出了倾斜校正程序的应用，以减少缝合误差，并相应地减少了光子线波导中的传播损耗。作者表明，由缝合误差引起的传播损耗的测量结果与数值结果非常吻合。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号