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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Study of the assist features effect on the through focus behavior in isoline with an innovative method
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Study of the assist features effect on the through focus behavior in isoline with an innovative method

机译:用创新方法研究辅助特征对等值线透焦性能的影响

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Driven by the ever shrinking feature size in the chip design and the complexity of the heuristic subresolution assist feature (SRAF) placement rules, more wafer data for calibration and more effort on the part of design engineers are necessary for each process node. The main purpose of placing assist features around the main feature is to improve the through focus robustness on the target edge of the main feature. Therefore, it is desirable to study the effect of assist feature placement on the main feature in terms of the focus sensitivity with a quick and accurate method. In this paper, an innovative way of calculating the signal dependence on the locations of the SRAF placed in the isoline pattern is proposed. The results indicated that the optimal location for the assist feature placement to increase the depth of focus is about 380 nm from the isoline center and is independent of the isoline structure for an annular illumination system. The results are verified by using independent tools and measured before and after optical proximity correction. Consistency of the optimal assist feature location is observed, and a qualitative explanation of the observations is presented.
机译:由于芯片设计中不断缩小的功能尺寸以及启发式亚分辨率辅助功能(SRAF)放置规则的复杂性,每个处理节点都需要更多的晶圆数据进行校准,并且设计工程师需要付出更多的努力。将辅助特征放置在主要特征周围的主要目的是提高贯穿特征在主要特征的目标边缘上的鲁棒性。因此,期望以快速和准确的方法来研究辅助特征放置对主要特征的聚焦灵敏度方面的影响。在本文中,提出了一种创新的方法来计算等值线图中放置的SRAF位置的信号依赖性。结果表明,用于辅助特征放置以增加焦点深度的最佳位置是距等值线中心约380 nm,并且与环形照明系统的等值线结构无关。通过使用独立工具验证结果,并在光学邻近校正之前和之后进行测量。观察到最佳辅助特征位置的一致性,并给出了对观察结果的定性解释。

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