High brightness 100-electron-beam source for high-resolution applications

Yanxia Zhang; P. Kruit

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High brightness 100-electron-beam source for high-resolution applications

机译：高亮度100电子束源，用于高分辨率应用

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摘要

The design of a 100-beam source for high-resolution applications is presented, comprising a Schottky emitter, an aperture lens array, an accelerator lens, and a conjugate blanker array. The beamlets emerge at 30 kV, compatible with most scanning electron microscope-type-systems commercially available. The aberrations due to the aperture lens array and the accelerator lens are carefully minimized. For a Schottky source with a brightness of 1.5 × 10~8 A/m~2 sr V, the multibeam source is designed to allow a transmission of more than 1000 nA current to the reduction optics with uniform spot sizes.

机译：提出了一种用于高分辨率应用的100束光源的设计，包括肖特基发射器，孔径透镜阵列，加速器透镜和共轭消隐器阵列。子束以30 kV出现，可与市售的大多数扫描电子显微镜类型系统兼容。小心地将由于光圈透镜阵列和加速器透镜引起的像差最小化。对于亮度为1.5×10〜8 A / m〜2 sr V的肖特基光源，多光束光源设计为允许将1000 nA以上的电流传输到具有均匀光斑尺寸的还原光学器件。

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《Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures》 |2007年第6期|p.2239-2244|共6页
作者
Yanxia Zhang; P. Kruit;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程物理学;
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High brightness 100-electron-beam source for high-resolution applications

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