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首页> 外文期刊>Materials Chemistry and Physics >Growth of nanocrystalline TiO_2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering
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Growth of nanocrystalline TiO_2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering

机译：直流反应磁控溅射沉积TiO_2纳米薄膜的生长及锐钛矿相的晶体各向异性

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摘要

This work describes the growth and elastic anisotropy of nanocrystalline TiC>2 films deposited by direct current reactive magnetron sputtering. The films are nanocrystalline in the gas pressure range 0.4-1.0 Pa even in the absence of substrate bias and substrate heating. It has been observed that gas pressure has a considerable effect on the phase evolution of TiO_2 and at a higher pressure, nanocrystalline anatase can be produced with a greater crystallinity and dense surface. X-ray diffraction line profile analysis of anatase TiO_2 has been performed and the integral breadth expressions of line broadening due to the domain size and lattice microstrain are combined on the basis of the Williamson-Hall (WH) method. The Miller indices dependence of Young's modulus is estimated on the basis of the Reuss approximation for polycrystalline aggregates. Young's modulus shows strong anisotropy. The anisotropic nature of the elastic medium has been introduced in the classical WH plot under the uniform stress deformation model (USDM) and uniform deformation energy density model (UDEDM). USDM represents the better fit of the experimental data.
机译：这项工作描述了直流反应磁控溅射沉积的纳米晶TiC> 2薄膜的生长和弹性各向异性。即使在没有衬底偏压和衬底加热的情况下，该膜也是在0.4-1.0Pa的气压范围内的纳米晶体。已经观察到气压对TiO 2的相演化具有相当大的影响，并且在更高的压力下，可以产生具有更大结晶度和致密表面的纳米晶锐钛矿。进行了锐钛矿型TiO_2的X射线衍射线轮廓分析，并基于Williamson-Hall（WH）方法，结合了由于畴尺寸和晶格微应变而引起的线展宽的积分宽度表达式。杨氏模量的米勒指数依赖性是根据多晶聚集体的Reuss近似值估算的。杨氏模量显示出很强的各向异性。在经典的WH图中，在均匀应力变形模型（USDM）和均匀变形能量密度模型（UDEDM）下引入了弹性介质的各向异性。 USDM代表实验数据的更好拟合。

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  • 来源
    《Materials Chemistry and Physics》 |2013年第3期|979-987|共9页
  • 作者

    Bimal K. Sarma; Arup R. Pal; Heremba Bailung; Joyanti Chutia;

  • 作者单位

    Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Cuwahati 781035, India,Department of Physics, Gauhati University, Copinath Bordoloi Nagar, Cuwahati 781014, India;

    Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Cuwahati 781035, India;

    Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Cuwahati 781035, India;

    Physical Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Cuwahati 781035, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin films; Sputtering; Microstructure; Luminescence; Elastic properties;

    机译：薄膜;溅射;微观结构发光;弹性特性;

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